21 results
Si/TiOx Core/Shell Nanowires with Branched Cathode Support Structures for Pt Catalysts in PEM Fuel Cells
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1497 / 2013
- Published online by Cambridge University Press:
- 28 March 2013, mrsf12-1497-k06-41
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- 2013
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CHEMOTAXONOMIC STUDIES OF ANTS: FREE AMINO ACIDS
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- The Canadian Entomologist / Volume 101 / Issue 11 / November 1969
- Published online by Cambridge University Press:
- 31 May 2012, pp. 1207-1213
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CHEMOTAXONOMIC STUDIES OF ANTS: VOLATILE COMPOUNDS
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- The Canadian Entomologist / Volume 101 / Issue 8 / August 1969
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- 31 May 2012, pp. 879-883
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On the effects of thermal treatment on the composition, structure, morphology, and optical properties of hydrogenated amorphous silicon-oxycarbide
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- Journal of Materials Research / Volume 24 / Issue 8 / August 2009
- Published online by Cambridge University Press:
- 31 January 2011, pp. 2561-2573
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- August 2009
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A study of ruthenium ultrathin film nucleation on pretreated SiO2 and Hf–silicate dielectric surfaces
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- Journal of Materials Research / Volume 22 / Issue 8 / August 2007
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- 31 January 2011, pp. 2254-2264
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- August 2007
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Electrical Properties of Ultrathin Al2O3 Films Grown by Metalorganic Chemical Vapor Deposition for Advanced Complementary Metal-oxide Semiconductor Gate Dielectric Applications
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- Journal of Materials Research / Volume 20 / Issue 6 / June 2005
- Published online by Cambridge University Press:
- 01 June 2005, pp. 1536-1543
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- June 2005
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Erbium-doped Amorphous- Si-C-O Matrix (a-SiCxOy:Er) - A Novel Silicon-based Material for Near-infrared Optoelectronic Applications
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- MRS Online Proceedings Library Archive / Volume 866 / 2005
- Published online by Cambridge University Press:
- 01 February 2011, V6.5
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- 2005
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Chemical vapor deposition of ruthenium and ruthenium oxide thin films for advanced complementary metal-oxide semiconductor gate electrode applications
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- Journal of Materials Research / Volume 19 / Issue 10 / October 2004
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- 01 October 2004, pp. 2947-2955
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- October 2004
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Atomic layer deposition of tantalum nitride for ultrathin liner applications in advanced copper metallization schemes
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- Journal of Materials Research / Volume 19 / Issue 2 / February 2004
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- 03 March 2011, pp. 447-453
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- February 2004
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Low-temperature metalorganic chemical vapor deposition of Al2O3 for advanced complementary metal-oxide semiconductor gate dielectric applications
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- Journal of Materials Research / Volume 18 / Issue 8 / August 2003
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- 31 January 2011, pp. 1868-1876
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- August 2003
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Characterization of Ruthenium and Ruthenium Oxide Thin Films deposited by Chemical Vapor Deposition for CMOS Gate Electrode Applications
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- MRS Online Proceedings Library Archive / Volume 745 / 2002
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- 11 February 2011, N3.3
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- 2002
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Investigations of Substrate-Selective Covalent Attachment for Genetically-Engineered Molecular Interconnects
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- MRS Online Proceedings Library Archive / Volume 728 / 2002
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- 01 February 2011, S8.4
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- 2002
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Low Temperature Metal Organic Chemical Vapor Deposition of Aluminum Oxide Thin Films for Advanced CMOS Gate Dielectric Applications
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- Journal:
- MRS Online Proceedings Library Archive / Volume 716 / 2002
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- 01 February 2011, B4.11
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- 2002
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Metalorganic chemical vapor deposition of titanium oxide for microelectronics applications
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- Journal of Materials Research / Volume 16 / Issue 6 / June 2001
- Published online by Cambridge University Press:
- 31 January 2011, pp. 1838-1849
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- June 2001
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Physical Properties and Diffusion Characteristics of CVD-Grown TiSiN Films
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- MRS Online Proceedings Library Archive / Volume 697 / January 2001
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- 17 March 2011, P8.18
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- January 2001
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The 2,2,6,6-Tetramethyl-2-Sila-3,5-Heptanedione Route to the Chemical Vapor Deposition of Copper for Gigascale Interconnect Applications
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- MRS Online Proceedings Library Archive / Volume 612 / 2000
- Published online by Cambridge University Press:
- 17 March 2011, D6.8.1
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- 2000
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IN-SITU Analysis Of The Microstructure of Thermally Treated Thin Copper Films
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- MRS Online Proceedings Library Archive / Volume 309 / 1993
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- 21 February 2011, 377
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- 1993
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Ultra Thin Sacrificial Diffusion Barriers - Control of Diffusion Across the Cu-SiO2 Interface
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- MRS Online Proceedings Library Archive / Volume 318 / 1993
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- 21 February 2011, 319
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- 1993
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Observation of Reduced Oxidation Rates for Plasmaassisted CVD Copper Films
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- MRS Online Proceedings Library Archive / Volume 309 / 1993
- Published online by Cambridge University Press:
- 21 February 2011, 455
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- 1993
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The Effect of Grain Boundaries and Substrate Interactions with Hydrogen on the CVD Growth of Device-Quality Copper.
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- MRS Online Proceedings Library Archive / Volume 229 / 1991
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- 15 February 2011, 123
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- 1991
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