Field studies were conducted in 2011 and 2012 at the Horticultural Crops Research Station near Clinton, NC, to determine ‘Covington' sweetpotato tolerance to S-metolachlor rate and application timing. Treatments were a factorial arrangement of four S-metolachlor rates (0, 1.1, 2.2, or 3.4 kg ai ha−1) and six application timings (0, 2, 5, 7, 9, or 14 d after transplanting [DAP]). Immediately following application, 1.9 cm of irrigation was applied to individual plots. Sweetpotato injury was minimal for all treatments (≤ 10%). No. 1 grade sweetpotato yield displayed a negative linear response to S-metolachlor rate, and decreased from 25,110 to 20,100 kg ha−1 as S-metolachlor rate increased from 0 to 3.4 kg ha−1. Conversely, no. 1 sweetpotato yield displayed a positive linear response to S-metolachlor application timing and increased from 19,670 to 27,090 kg ha−1 as timing progressed from 0 to 14 DAP. Total marketable sweetpotato yield displayed a quadratic response to both S-metolachlor application rate and timing. Total marketable yield decreased from 44,950 to 30,690 kg ha−1 as S-metolachlor rate increased from 0 to 3.4 kg ha−1. Total marketable yield increased from 37,800 to 45,780 kg ha−1 as application timing was delayed from 0 to 14 DAP. At 1.1 kg ha−1 S-metolachlor, sweetpotato storage root length to width ratio displayed a quadratic relationship to application timing and increased from 1.87 to 2.23 for applications made 0 to 14 DAP. At 2.2 kg ha−1 of S-metolachlor, sweetpotato length to width ratio displayed a quadratic response to application timing, increased from 1.57 to 2.09 for 0 to 10 DAP, and decreased slightly from 2.09 to 2.03 for 10 to 14 DAP. Application timing did not influence length to width ratio of sweetpotato storage roots for those plots treated with S-metolachlor at either 0 or 3.4 kg ha−1.

Interdiffusion and intermetallic formation in Ni-Sn interfacial zones are examined by X-ray diffraction in samples prepared by electroplating of Sn at room temperature. For the case of plating directly onto electropolished nickel, only very sluggish formation of Ni3Sn4 was observed at 190 C. In contrast, when the nickel surface is chemicaly or chemically-abrasively activated prior to plating, a thin layer of Ni3Sn forms at the initial interface at room temperature, and subsequent annealing at 100 and 190 C produces all intermetallics predicted by the equilibrium phase diagram including Ni3Sn, indicating that the absence of Ni3Sn usually observed arises from its failure to nucleate.

At the Savannah River Site (SRS) we are currently finalizing the design for a multi-system vitrification process that will be installed in the F-Canyon Multi-Purpose Process Facility (MPPF), an existing highly shielded, remotely operated facility. Authorization to proceed beyond the preliminary design based on the recommendation of a Formal Design Review Board was requested in May of 1999.

The Savannah River Technology Center (SRTC) Process Development Group has been conducting research and developing a process to identify equipment design bases and process operating parameters since 1996. The goal of the project is to stabilize a tank of ∼11,000 liters of nitric acid solution containing valuable isotopes of americium (Am) and curium (Cm). Vitrification has been selected as the most attractive alternative for stabilization and provides the opportunity for recovery and eventual reuse of the actinides. The final glass form will be placed in interim storage awaiting a disposition by the Department of Energy. This paper presents a brief history of the stabilization program and an overview of the entire Am/Cm stabilization process. This paper also provides details of a specific processing issue related to drain tube pluggage (devitrification) that was encountered during the development of the baseline batch vitrification process, and the remedy employed to reduce the potential for further drain tube pluggage.