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Crystallographic Texture and Phase Formation in Blanket TifriN/AICu Films
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- MRS Online Proceedings Library Archive / Volume 514 / 1998
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- 10 February 2011, 105
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- 1998
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Lowering the formation temperature of the C54-TiSi2 phase using a metallic interfacial layer
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- Journal of Materials Research / Volume 12 / Issue 2 / February 1997
- Published online by Cambridge University Press:
- 31 January 2011, pp. 304-307
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- February 1997
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In Situ Tem Analysis of TiSi2 C49-C54 Transformations During Annealing
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- MRS Online Proceedings Library Archive / Volume 441 / 1996
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- 10 February 2011, 255
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- 1996
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Dependence of Crystallographic Texture of C54 Tisi2 on Thickness and Linewidth In Submicron Cmos Structures
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- MRS Online Proceedings Library Archive / Volume 427 / 1996
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- 15 February 2011, 53
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- 1996
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Phase Transformation and Microstructural Properties in Sputtered Vs. CVD WSi, Films
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- MRS Online Proceedings Library Archive / Volume 441 / 1996
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- 10 February 2011, 3
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- 1996
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Phase Formation in Cu(Sn) Alloy Thin Films
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- MRS Online Proceedings Library Archive / Volume 427 / 1996
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- 15 February 2011, 133
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- 1996
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In-Situ x-Ray Diffraction Analysis of TiSi2 Phase Formation from a Titanium-Molybdenum Bilayer
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- MRS Online Proceedings Library Archive / Volume 441 / 1996
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- 10 February 2011, 295
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- 1996
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Surface Roughening During Titanium Silicide Formation: a Comparison Between Si(100) and Poly-Si Substrates
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- MRS Online Proceedings Library Archive / Volume 440 / 1996
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- 15 February 2011, 389
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- 1996
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Light Scattering Measurement Of Surface Topography During Formation Of Titanium Silicide.
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- MRS Online Proceedings Library Archive / Volume 406 / 1995
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- 15 February 2011, 163
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- 1995
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A Kinetic Study of the C49 to C54 Conversion in TiSi2 Using Electrical Resistivity Measurements on Single Sub-Micron Lines
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- MRS Online Proceedings Library Archive / Volume 402 / 1995
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- 15 February 2011, 275
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- 1995
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In-Situ resistance Measurements During Rapid Thermal Annealing for Process Characterization
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- MRS Online Proceedings Library Archive / Volume 387 / 1995
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- 15 February 2011, 49
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- 1995
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Reduction of the C54-TiSi2 Phase Formation Temperature Using Metallic Impurities
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- MRS Online Proceedings Library Archive / Volume 402 / 1995
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- 15 February 2011, 95
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- 1995
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In Situ Analysis of the Formation of thin TISI2, (>50 nm) Contacts in Submicron Cmos Structures during Rapid Thermal Annealing
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- MRS Online Proceedings Library Archive / Volume 402 / 1995
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- 15 February 2011, 257
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- 1995
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In-Situ X-Ray Diffraction and Resistivity Analysis of CoSi2 Phase Formation with and without a Ti Interlayer at Rapid Thermal Annealing Rates
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- MRS Online Proceedings Library Archive / Volume 375 / 1994
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- 15 February 2011, 253
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- 1994
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Composition Dependence of Crystallization of Co-Si Alloys
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- MRS Online Proceedings Library Archive / Volume 260 / 1992
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- 25 February 2011, 175
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- 1992
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Kinetics of Intermetallic Formation in Free Standing Cu/Mg Multilayer Thin Films
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- MRS Online Proceedings Library Archive / Volume 260 / 1992
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- 25 February 2011, 947
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- 1992
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Effects of Ion Implantation on Crystallization of Amorphous CoSi2
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- MRS Online Proceedings Library Archive / Volume 279 / 1992
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- 25 February 2011, 541
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- 1992
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Time-Resolved Optical Studies of Amorphous CoSi Thin-Film Crystallization
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- MRS Online Proceedings Library Archive / Volume 280 / 1992
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- 25 February 2011, 715
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- 1992
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Effect of Deposition Conditions on Intrinsic Stress, Phase Transformation and Stress Relaxation in Tantalum Thin Films
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- MRS Online Proceedings Library Archive / Volume 239 / 1991
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- 22 February 2011, 51
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- 1991
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Effect of an Interfacial Ti Layer on the Formation of CoSi2 on Si
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- MRS Online Proceedings Library Archive / Volume 238 / 1991
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- 25 February 2011, 575
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- 1991
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