7 results
Theoretical and Experimental Analysis of the Low Dielectric Constant of Fluorinated Silica
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- Journal:
- MRS Online Proceedings Library Archive / Volume 612 / 2000
- Published online by Cambridge University Press:
- 17 March 2011, D3.8.1
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- 2000
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Epitaxial Growth of AlN on Si Substrates with Intermediate 3C-SiC as Buffer Layers
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- Journal:
- MRS Online Proceedings Library Archive / Volume 572 / 1999
- Published online by Cambridge University Press:
- 10 February 2011, 407
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- 1999
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Theoretical and Experimental Analysis of the Low Dielectric Constant of Fluorinated Silica
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- Journal:
- MRS Online Proceedings Library Archive / Volume 579 / 1999
- Published online by Cambridge University Press:
- 15 February 2011, 255
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- 1999
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Stoichiometric Effects of Sputtered Barium Strontium Titanate Films
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- Journal:
- MRS Online Proceedings Library Archive / Volume 493 / 1997
- Published online by Cambridge University Press:
- 10 February 2011, 21
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- 1997
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Quantification and Characterization of the Thermal Degradation of TiSi2 Using Thermal Wave Analysis
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- Journal:
- MRS Online Proceedings Library Archive / Volume 260 / 1992
- Published online by Cambridge University Press:
- 25 February 2011, 213
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- 1992
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The Effects of SI Addition on the Properties of AICu Films used in Multilevel Metal Systems
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- Journal:
- MRS Online Proceedings Library Archive / Volume 181 / 1990
- Published online by Cambridge University Press:
- 25 February 2011, 545
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- 1990
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An analysis of high temperature (1150 °C) furnace annealing of buried oxide wafers formed by ion implantation
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- Journal:
- Journal of Materials Research / Volume 4 / Issue 1 / February 1989
- Published online by Cambridge University Press:
- 31 January 2011, pp. 167-176
- Print publication:
- February 1989
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