11 results
Charge Transport in Low Stress Si-rich Silicon Nitride Thin Films
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- Journal:
- MRS Online Proceedings Library Archive / Volume 687 / 2001
- Published online by Cambridge University Press:
- 15 March 2011, B5.11
- Print publication:
- 2001
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Properties of Low Residual Stress Silicon Oxynitrides Used as a Sacrificial Layer
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- Journal:
- MRS Online Proceedings Library Archive / Volume 605 / 1999
- Published online by Cambridge University Press:
- 10 February 2011, 49
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- 1999
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Bonding of Hydrogen and Deuterium in Silicon Nitride Films Prepared by Remote Plasma Enhanced Chemical Vapor Deposition
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- Journal:
- MRS Online Proceedings Library Archive / Volume 377 / 1995
- Published online by Cambridge University Press:
- 15 February 2011, 313
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- 1995
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Microstructure of Si Films Deposited on Si(100) Surfaces by Remote Plasma-Enhanced Chemicalvapor Deposition, Rpecvd: Dependence on Process Pressure and Substrate Temperature
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- Journal:
- MRS Online Proceedings Library Archive / Volume 311 / 1993
- Published online by Cambridge University Press:
- 21 February 2011, 379
- Print publication:
- 1993
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Growth and Characterization of Si-GaP and Si-GaP-Si Heterostructures
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- Journal:
- MRS Online Proceedings Library Archive / Volume 334 / 1993
- Published online by Cambridge University Press:
- 22 February 2011, 495
- Print publication:
- 1993
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Comparison of Trapping States at SiO2/Si Interfaces on si(100), (110), and (111) Prepared by Plasma-Assisted Oxidation and Oxide Deposition, and by Exposure to Atomic H Prior to Oxidation and Deposition
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- Journal:
- MRS Online Proceedings Library Archive / Volume 262 / 1992
- Published online by Cambridge University Press:
- 03 September 2012, 473
- Print publication:
- 1992
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A New Two-Step Plasma-Assisted Surface Cleaningoxidation and Film-Deposition Process Sequence for The Formation of Si(100)/SiO2 Interfaces with Low Densities of Interfacial Traps
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- Journal:
- MRS Online Proceedings Library Archive / Volume 259 / 1992
- Published online by Cambridge University Press:
- 25 February 2011, 69
- Print publication:
- 1992
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Quasi-Stoichiometric Silicon Nitride Thin Films Deposited by Remote Plasma-Enhanced Chemical-Vapor Deposition
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- Journal:
- MRS Online Proceedings Library Archive / Volume 284 / 1992
- Published online by Cambridge University Press:
- 22 February 2011, 33
- Print publication:
- 1992
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Si-N Bonding at The SiO2/Si Interfaces During Deposition of SiO2 by the Remote Pecvd Process
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- Journal:
- MRS Online Proceedings Library Archive / Volume 235 / 1991
- Published online by Cambridge University Press:
- 28 February 2011, 799
- Print publication:
- 1991
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Si-N Bonding at the SiO2/Si Interfaces During Deposition of SiO2 by the Remote Pecvd Process
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- Journal:
- MRS Online Proceedings Library Archive / Volume 236 / 1991
- Published online by Cambridge University Press:
- 25 February 2011, 341
- Print publication:
- 1991
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Si(100) Surface Preparation by In-Situ or in-Vacuo Exposure to Remotely Plasma-Generated Atomic Hydrogen: Applications to Deposited SiO2 and Epitaxial Growth of Si
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- Journal:
- MRS Online Proceedings Library Archive / Volume 202 / 1990
- Published online by Cambridge University Press:
- 25 February 2011, 395
- Print publication:
- 1990
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