13 results
Structural and Chemical Characterization of Tungsten Gate Stack for 1 Gb Dram
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- Journal:
- MRS Online Proceedings Library Archive / Volume 611 / 2000
- Published online by Cambridge University Press:
- 14 March 2011, C3.3.1
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- 2000
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A comparison of C54-TiSi2 formation in blanket and submicron gate structures using in situ x-ray diffraction during rapid thermal annealing
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- Journal:
- Journal of Materials Research / Volume 10 / Issue 9 / September 1995
- Published online by Cambridge University Press:
- 03 March 2011, pp. 2355-2359
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- September 1995
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Observation of Crystallization, Precipitation, and Phase Transformation Phenomena in Si Rich Titanium Silicide Thin Films
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- MRS Online Proceedings Library Archive / Volume 398 / 1995
- Published online by Cambridge University Press:
- 21 February 2011, 463
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- 1995
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In-Situ Resistance Measurements During Rapid Thermal Annealing for Process Characterization
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- MRS Online Proceedings Library Archive / Volume 389 / 1995
- Published online by Cambridge University Press:
- 15 February 2011, 321
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- 1995
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Titanium Silicides and their Technological Applications
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- MRS Online Proceedings Library Archive / Volume 320 / 1993
- Published online by Cambridge University Press:
- 03 September 2012, 15
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- 1993
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Rapid Evaluation of Thin Film Interfacial Reactions Using Temperature-Ramped Measurements
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- Journal:
- MRS Online Proceedings Library Archive / Volume 318 / 1993
- Published online by Cambridge University Press:
- 21 February 2011, 307
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- 1993
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Compressive Stress Increase With Repeated Thermal Cycling in Tantalum(Oxygen) Thin Films
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- Journal:
- MRS Online Proceedings Library Archive / Volume 308 / 1993
- Published online by Cambridge University Press:
- 15 February 2011, 57
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- 1993
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Nucleation of an intermetallic at thin-film interfaces: VSi2 contrasted with Al3Ni
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- Journal:
- Journal of Materials Research / Volume 7 / Issue 6 / June 1992
- Published online by Cambridge University Press:
- 31 January 2011, pp. 1350-1355
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- June 1992
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Kinetic and Thermodynamic Aspects of Phase Evolution in Ti/a-Si Multilayer Films
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- Journal:
- MRS Online Proceedings Library Archive / Volume 187 / 1990
- Published online by Cambridge University Press:
- 21 February 2011, 83
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- 1990
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Effect of Oxygen Exposure and Deposition Environment on Thermal Stability of Ta Barriers To Cu Penetration.
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- Journal:
- MRS Online Proceedings Library Archive / Volume 203 / 1990
- Published online by Cambridge University Press:
- 25 February 2011, 387
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- 1990
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A Calorimetric Study of the Kinetics of Al3Ni Nucleation and Growth During Reactions in Al/Ni Thin Films
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- Journal:
- MRS Online Proceedings Library Archive / Volume 205 / 1990
- Published online by Cambridge University Press:
- 26 February 2011, 203
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- 1990
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Structural Transitions in Titanium/Amorphous-Silicon Multilayers
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- Journal:
- MRS Online Proceedings Library Archive / Volume 163 / 1989
- Published online by Cambridge University Press:
- 25 February 2011, 961
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- 1989
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Kinetics and Thermodynamics of Amorphous Silicide Formation in Nickel/Amorphous-Silicon Multilayer Thin Films
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- MRS Online Proceedings Library Archive / Volume 148 / 1989
- Published online by Cambridge University Press:
- 25 February 2011, 77
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- 1989
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