9 results
The Influence of Nitrogen Doping on the Chemical and Local Bonding Environment of Amorphous and Crystalline Ge2Sb2Te5
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1160 / 2009
- Published online by Cambridge University Press:
- 31 January 2011, 1160-H13-08
- Print publication:
- 2009
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Tetragonal Phase in Ge Doped HfO2 Films on Si Investigated by X-ray Absorption Spectroscopy
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1194 / 2009
- Published online by Cambridge University Press:
- 31 January 2011, 1194-A01-02
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- 2009
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Degradation and SILC Effects of RPECVD sub-2.0nm Oxide/Nitride and Oxynitride Dielectrics Under Constant Current Stress
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- Journal:
- MRS Online Proceedings Library Archive / Volume 716 / 2002
- Published online by Cambridge University Press:
- 01 February 2011, B2.9
- Print publication:
- 2002
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Diffusion of Hydrogen and Deuterium in Stack Systems of SixNyHz/SixNyDz and Crystalline Si
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- Journal:
- MRS Online Proceedings Library Archive / Volume 609 / 2000
- Published online by Cambridge University Press:
- 17 March 2011, A26.7
- Print publication:
- 2000
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Why SiNx:H is the Preferred Gate Dielectric for Amorphous Si Thin Film Transistors (TFTS) and SiO2 is the Preferred Gate Dielectric for Polycrystalline Si TFTs
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- Journal:
- MRS Online Proceedings Library Archive / Volume 558 / 1999
- Published online by Cambridge University Press:
- 10 February 2011, 135
- Print publication:
- 1999
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Aggressively Scaled P-Channel Mosfets With Stacked Nitride-Oxide-Nitride, N/O/N, Gate Dielectrics
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- Journal:
- MRS Online Proceedings Library Archive / Volume 567 / 1999
- Published online by Cambridge University Press:
- 10 February 2011, 101
- Print publication:
- 1999
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Production of Silicon Nanocrystals by Thermal Annealing of Silicon-Oxygen and Silicon-Oxygen-Carbon Alloys: Model Systems for Chemical and Structural Relaxation at Si-SiO2 and Sic-SiO2 Interfaces
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- Journal:
- MRS Online Proceedings Library Archive / Volume 536 / 1998
- Published online by Cambridge University Press:
- 09 August 2011, 111
- Print publication:
- 1998
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Controlled Nitrogen-Atom Incorporation At Si-SiO2 Interfaces in Mis Devices
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- Journal:
- MRS Online Proceedings Library Archive / Volume 386 / 1995
- Published online by Cambridge University Press:
- 15 February 2011, 243
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- 1995
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Electron Cycloytron Resonance Plasma Etching/Cleaning For Si Device Fabrication
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- Journal:
- MRS Online Proceedings Library Archive / Volume 315 / 1993
- Published online by Cambridge University Press:
- 21 February 2011, 225
- Print publication:
- 1993
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