5 results
Comparison of Novel Chlorine, Bromine and Iodine Plasma Chemistries for Anisotropic Trench Etching In GaN, InN and Ain
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- Journal:
- MRS Online Proceedings Library Archive / Volume 512 / 1998
- Published online by Cambridge University Press:
- 10 February 2011, 501
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- 1998
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Wet Chemical Etching Survey Of III-Nitrides
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- Journal:
- MRS Online Proceedings Library Archive / Volume 483 / 1997
- Published online by Cambridge University Press:
- 10 February 2011, 265
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- 1997
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High Temperature Photoluminescence and Photoluminescence Excitation Spectroscopy of Er Doped Gallium Nitride
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- Journal:
- MRS Online Proceedings Library Archive / Volume 482 / 1997
- Published online by Cambridge University Press:
- 10 February 2011, 685
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- 1997
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Reduction of Sidewall Roughness During Dry Etching of SiO2
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- Journal:
- MRS Online Proceedings Library Archive / Volume 282 / 1992
- Published online by Cambridge University Press:
- 22 February 2011, 529
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- 1992
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Properties of Pt/Ti Contacts to III-V Materials
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- Journal:
- MRS Online Proceedings Library Archive / Volume 216 / 1990
- Published online by Cambridge University Press:
- 25 February 2011, 305
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- 1990
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