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Long-Range Diffusion of Transition Metals in Silicon During Rapid Thermal Annealing
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- Journal:
- MRS Online Proceedings Library Archive / Volume 146 / 1989
- Published online by Cambridge University Press:
- 25 February 2011, 385
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- 1989
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Device Degrading Interactions between Silicide Films and Bulk Defects during Rapid Thermal Annealing
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- Journal:
- MRS Online Proceedings Library Archive / Volume 146 / 1989
- Published online by Cambridge University Press:
- 25 February 2011, 167
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- 1989
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Thermal Stability in the <Si>/TiSi2/TiN/Al Metallization System
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- Journal:
- MRS Online Proceedings Library Archive / Volume 146 / 1989
- Published online by Cambridge University Press:
- 25 February 2011, 235
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- 1989
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Effects of Rapid Thermal Processing on Thermal Oxides of Silicon#
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- Journal:
- MRS Online Proceedings Library Archive / Volume 71 / 1986
- Published online by Cambridge University Press:
- 28 February 2011, 449
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- 1986
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A Novel Silicided Shallow Junction Technology for Cmos VLSI
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- Journal:
- MRS Online Proceedings Library Archive / Volume 71 / 1986
- Published online by Cambridge University Press:
- 28 February 2011, 379
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- 1986
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