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Volume 11 - October 2005

Contents

Page 61 of 61

Materials Research in an Aberration-Free Environment

Research Article

  • Design and Testing of a Quadrupole/Octupole C3/C5 Aberration Corrector

  • N Dellby, O L Krivanek, M F Murfitt, P D Nellist
  • Published online by Cambridge University Press:
    01 August 2005, pp. 2130-2131
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  • Extended abstract of a paper presented at Microscopy and Microanalysis 2005 in Honolulu, Hawaii, USA, July 31--August 4, 2005

  • Advantages of Cs-correctors for Spectrometry in STEM

  • M Watanabe, D W Ackland, A Burrows, C J Kiely, D B Williams, M Kanno, R Hynes
  • Published online by Cambridge University Press:
    01 August 2005, pp. 2132-2133
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  • Extended abstract of a paper presented at Microscopy and Microanalysis 2005 in Honolulu, Hawaii, USA, July 31--August 4, 2005

  • Performance of a new Monochromator for a 200 kV Analytical Electron Microscope

  • M Mukai, T Kaneyama, T Tomita, K Tsuno, M Terauchi, K Tsuda, M Naruse, T Honda, M Tanaka
  • Published online by Cambridge University Press:
    01 August 2005, pp. 2134-2135
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  • Extended abstract of a paper presented at Microscopy and Microanalysis 2005 in Honolulu, Hawaii, USA, July 31--August 4, 2005

  • Design and Performance Characteristics of the ORNL Advanced Microscopy Laboratory and JEOL 2200FS-AC Aberration-Corrected STEM/TEM

  • L F Allard, D A Blom, M A O'Keefe, S Mishina
  • Published online by Cambridge University Press:
    01 August 2005, pp. 2136-2137
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  • Extended abstract of a paper presented at Microscopy and Microanalysis 2005 in Honolulu, Hawaii, USA, July 31--August 4, 2005

  • Aberration Corrected Microscopy and Moore’s Law: Capabilities Aiding Progress for the Next Decade

  • J Mardinly
  • Published online by Cambridge University Press:
    01 August 2005, pp. 2138-2139
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  • Extended abstract of a paper presented at Microscopy and Microanalysis 2005 in Honolulu, Hawaii, USA, July 31--August 4, 2005

  • Aberration Free Microscopy for Life Science Applications

  • J M Plitzko, B Freitag, R Hegerl, U Luecken
  • Published online by Cambridge University Press:
    01 August 2005, pp. 2140-2141
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  • Extended abstract of a paper presented at Microscopy and Microanalysis 2005 in Honolulu, Hawaii, USA, July 31--August 4, 2005

  • The TEAM Project - An Update

  • U Dahmen
  • Published online by Cambridge University Press:
    01 August 2005, pp. 2142-2143
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  • Extended abstract of a paper presented at Microscopy and Microanalysis 2005 in Honolulu, Hawaii, USA, July 31--August 4, 2005

  • Design Features and Ultimate Performance of an Ultra-High Resolution Aberration-Corrected, Monochromatized 200 keV FEG-TEM éáúüø

  • A E Thesen, M Matijevic, G Benner
  • Published online by Cambridge University Press:
    01 August 2005, pp. 2144-2145
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  • Extended abstract of a paper presented at Microscopy and Microanalysis 2005 in Honolulu, Hawaii, USA, July 31--August 4, 2005

  • First Experiences using Electron Holography with a Cs-Corrected TEM

  • M Lehmann, D Geiger, H Lichte
  • Published online by Cambridge University Press:
    01 August 2005, pp. 2146-2147
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  • Extended abstract of a paper presented at Microscopy and Microanalysis 2005 in Honolulu, Hawaii, USA, July 31--August 4, 2005

  • The Design and First Results of a Dedicated Corrector (S)TEM.

  • M A van der Stam, P Tiemeijer, B Freitag, M Stekelenburg, J Ringnalda
  • Published online by Cambridge University Press:
    01 August 2005, pp. 2148-2149
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  • Extended abstract of a paper presented at Microscopy and Microanalysis 2005 in Honolulu, Hawaii, USA, July 31--August 4, 2005

  • Cs Corrected Bright Field Imaging of Radiation Sensitive Materials

  • M Malac, M Beleggia, R F Egerton, Y Zhu
  • Published online by Cambridge University Press:
    01 August 2005, pp. 2150-2151
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  • Extended abstract of a paper presented at Microscopy and Microanalysis 2005 in Honolulu, Hawaii, USA, July 31--August 4, 2005

  • An Assessment of Imaging Models for Exit Wave Restoration

  • A I Kirkland, L-Y Chang
  • Published online by Cambridge University Press:
    01 August 2005, pp. 2152-2153
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  • Extended abstract of a paper presented at Microscopy and Microanalysis 2005 in Honolulu, Hawaii, USA, July 31--August 4, 2005

  • Contrast Transfer Theory for Transmission Electron Microscopes Equipped with a Wien-Filter Monochromator

  • M Lentzen, A Thust
  • Published online by Cambridge University Press:
    01 August 2005, pp. 2154-2155
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  • Extended abstract of a paper presented at Microscopy and Microanalysis 2005 in Honolulu, Hawaii, USA, July 31--August 4, 2005

  • Toward Z-Contrast HRTEM by Reversed Multislice Process

  • F-R Chen, C Kisielowski, J Jinshek, J Plitzko, J-J Kai
  • Published online by Cambridge University Press:
    01 August 2005, pp. 2156-2157
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  • Extended abstract of a paper presented at Microscopy and Microanalysis 2005 in Honolulu, Hawaii, USA, July 31--August 4, 2005

  • Chemical Composition and Thickness Retrieval in HRTEM by a Reversed Multislice Process

  • F-R Chen, C F Kisielowski, J R Jinschek, J Plitzko, J-J Kai
  • Published online by Cambridge University Press:
    01 August 2005, pp. 2158-2159
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  • Extended abstract of a paper presented at Microscopy and Microanalysis 2005 in Honolulu, Hawaii, USA, July 31--August 4, 2005

  • Transport of Intensity Equation Applied to Study Quasi-Dynamic Surface and Boundary Reconstruction

  • K Ishizuka
  • Published online by Cambridge University Press:
    01 August 2005, pp. 2160-2161
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  • Extended abstract of a paper presented at Microscopy and Microanalysis 2005 in Honolulu, Hawaii, USA, July 31--August 4, 2005

  • Cross-sectional Observations of Surface Structures on MgO{100} by Cs-corrected TEM

  • J Yamasaki, N Tanaka, Y Nakagaki, S Fukami, H Sawada
  • Published online by Cambridge University Press:
    01 August 2005, pp. 2162-2163
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  • Extended abstract of a paper presented at Microscopy and Microanalysis 2005 in Honolulu, Hawaii, USA, July 31--August 4, 2005

  • Three-Dimensional Aberration-Free Imaging Recovery by the Oversampling Method and Tomography

  • W-Y Yen, F-R Chen, J-J Kai
  • Published online by Cambridge University Press:
    01 August 2005, pp. 2164-2165
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  • Extended abstract of a paper presented at Microscopy and Microanalysis 2005 in Honolulu, Hawaii, USA, July 31--August 4, 2005

  • Measurement of 3rd Order Spherical Aberration Coefficient for Scanning Transmission Electron Microscopy

  • Y Kotaka, T Yamazaki, K Watanabe, Y Kikuchi, N Nakanishi, I Hashimoto
  • Published online by Cambridge University Press:
    01 August 2005, pp. 2166-2167
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  • Extended abstract of a paper presented at Microscopy and Microanalysis 2005 in Honolulu, Hawaii, USA, July 31--August 4, 2005

Page 61 of 61