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Article contents
Design Features and Ultimate Performance of an Ultra-High Resolution Aberration-Corrected, Monochromatized 200 keV FEG-TEM éáúüø
Published online by Cambridge University Press: 01 August 2005
Extract
Extended abstract of a paper presented at Microscopy and Microanalysis 2005 in Honolulu, Hawaii, USA, July 31--August 4, 2005
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- Research Article
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- © 2005 Microscopy Society of America