4 results
Sensitivity Analysis of Simulated Backscattered Electron Emission against Electron Dosage of Buried Semiconductor Features
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- Journal:
- Microscopy and Microanalysis / Volume 24 / Issue S1 / August 2018
- Published online by Cambridge University Press:
- 01 August 2018, pp. 698-699
- Print publication:
- August 2018
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Image Simulation and Analysis to Predict the Sensitivity Performance of a Multi-Electron Beam Critical Dimension Metrology Tool
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- Journal:
- Microscopy and Microanalysis / Volume 23 / Issue S1 / July 2017
- Published online by Cambridge University Press:
- 04 August 2017, pp. 1494-1495
- Print publication:
- July 2017
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Image Simulation and Analysis to Predict the Sensitivity Performance of a Multi-Electron Beam Wafer Defect Inspection Tool
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- Journal:
- Microscopy and Microanalysis / Volume 22 / Issue S3 / July 2016
- Published online by Cambridge University Press:
- 25 July 2016, pp. 620-621
- Print publication:
- July 2016
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Patterned Wafer Inspection with Multi-beam SEM Technology
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- Journal:
- Microscopy and Microanalysis / Volume 22 / Issue S3 / July 2016
- Published online by Cambridge University Press:
- 25 July 2016, pp. 586-587
- Print publication:
- July 2016
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