No CrossRef data available.
Article contents
Sensitivity Analysis of Simulated Backscattered Electron Emission against Electron Dosage of Buried Semiconductor Features
Published online by Cambridge University Press: 01 August 2018
Abstract
An abstract is not available for this content so a preview has been provided. As you have access to this content, a full PDF is available via the ‘Save PDF’ action button.
![Image of the first page of this content. For PDF version, please use the ‘Save PDF’ preceeding this image.'](https://static.cambridge.org/content/id/urn%3Acambridge.org%3Aid%3Aarticle%3AS1431927618003987/resource/name/firstPage-S1431927618003987a.jpg)
- Type
- Abstract
- Information
- Microscopy and Microanalysis , Volume 24 , Supplement S1: Proceedings of Microscopy & Microanalysis 2018 , August 2018 , pp. 698 - 699
- Copyright
- © Microscopy Society of America 2018
References
[1] Bunday, B., et al
Metrology, Inspection, and Process Control for Microlithography XXXI. Proc. SPIE 10145
2017) p. 101450G.Google Scholar
[3] Mukhtar, M.
Thiel, B. Metrology, Inspection, and Process Control for Microlithography XXXII, Proc. of SPIE 8324 (2018) p. 10585.Google Scholar