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Sensitivity Analysis of Simulated Backscattered Electron Emission against Electron Dosage of Buried Semiconductor Features

Published online by Cambridge University Press:  01 August 2018

Maseeh Mukhtar  and
Brad Thiel
Maseeh Mukhtar
Affiliation:
Colleges of Nanoscale Science and Engineering, SUNY Polytechnic Institute, Albany, NY
Brad Thiel
Affiliation:
Colleges of Nanoscale Science and Engineering, SUNY Polytechnic Institute, Albany, NY

Abstract

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Type
Abstract
Information
Microscopy and Microanalysis , Volume 24 , Supplement S1: Proceedings of Microscopy & Microanalysis 2018 , August 2018 , pp. 698 - 699
Copyright
© Microscopy Society of America 2018 

References

[1] Bunday, B., et al Metrology, Inspection, and Process Control for Microlithography XXXI. Proc. SPIE 10145 2017) p. 101450G.Google Scholar
[2] Villarrubia, J. S., et al, Ultramicroscopy 154 2015) p. 15.Google Scholar
[3] Mukhtar, M. Thiel, B. Metrology, Inspection, and Process Control for Microlithography XXXII, Proc. of SPIE 8324 (2018) p. 10585.Google Scholar