6 results
In-situ Metrology for End Point Detection during Chemical Mechanical Polishing of Shallow Trench Isolation Structure
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- Journal:
- MRS Online Proceedings Library Archive / Volume 867 / 2005
- Published online by Cambridge University Press:
- 01 February 2011, W8.4
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- 2005
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Optimization of Psiloquest's Application Specific CMP Pads for Commercialization
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- Journal:
- MRS Online Proceedings Library Archive / Volume 867 / 2005
- Published online by Cambridge University Press:
- 01 February 2011, W3.3
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- 2005
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Material Reliability and Integration Issues of Polyimide and Benzocyclobutene Interlayer Dielectric Materials
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- Journal:
- MRS Online Proceedings Library Archive / Volume 863 / 2005
- Published online by Cambridge University Press:
- 01 February 2011, B8.26
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- 2005
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Metrology of Psiloquest's Application Specific Pads (ASP) for CMP Applications
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- Journal:
- MRS Online Proceedings Library Archive / Volume 816 / 2004
- Published online by Cambridge University Press:
- 15 March 2011, K5.6
- Print publication:
- 2004
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Polishing Behavior of the Various Interconnect Thin Films in Cu Damascene Process with Different Slurries
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- Journal:
- MRS Online Proceedings Library Archive / Volume 767 / 2003
- Published online by Cambridge University Press:
- 01 February 2011, F6.9
- Print publication:
- 2003
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Metrology Issues in Cu-Low-K Chemical Mechanical Planarization
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- Journal:
- MRS Online Proceedings Library Archive / Volume 750 / 2002
- Published online by Cambridge University Press:
- 11 February 2011, Y9.7
- Print publication:
- 2002
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