The generation and usage of a reactive gas plasma for a wide range of applications has been cited since the early 1970's. More recently, the use of a plasma generating system has been applied to analytical transmission electron microscopy to minimize and, in some cases, eliminate the problems associated with various contamination sources, including the specimen holder and the specimen itself. Although the technology is well known, no definitive characterization of process parameters has been developed for specimen and specimen holder cleaning applications. An investigation of the effects that power levels and gas mixtures have upon contamination rates and removal were done using a Philips CM30T. Measurements of contamination rates both prior to and following plasma cleaning were done to characterize the effects of various parameter changes. Results of different process parameters and contamination rates will be reported.