5 results
A Comparative Study of Ti/Low-k HSQ (Hydrogen Silsesquioxane) and Ti/TEOS (Tetraethylorthosilicate) Structures at Elevated Temperatures
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- Journal:
- MRS Online Proceedings Library Archive / Volume 612 / 2000
- Published online by Cambridge University Press:
- 17 March 2011, D9.13.1
- Print publication:
- 2000
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The Integration of Low-k Dielectric Material Hydrogen Silsesquioxane (HSQ) with Nitride Thin Films as Barriers
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- Journal:
- MRS Online Proceedings Library Archive / Volume 612 / 2000
- Published online by Cambridge University Press:
- 17 March 2011, D9.11.1
- Print publication:
- 2000
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Tem Observations of AG-TI Bilayers After Thermal Aging Treatment in a Reducing Ambient
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- Journal:
- MRS Online Proceedings Library Archive / Volume 472 / 1997
- Published online by Cambridge University Press:
- 10 February 2011, 197
- Print publication:
- 1997
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Influence of Underlayer and Encapsulation Process on Texture in Polycrystalline Silver Thin Films
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- Journal:
- MRS Online Proceedings Library Archive / Volume 472 / 1997
- Published online by Cambridge University Press:
- 10 February 2011, 203
- Print publication:
- 1997
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Analysis of Residual Stress in Polycrystalline Silver Thin Films by X-Ray Diffraction
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- Journal:
- MRS Online Proceedings Library Archive / Volume 472 / 1997
- Published online by Cambridge University Press:
- 10 February 2011, 293
- Print publication:
- 1997
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