9 results
Reliability and validity of the Japanese version of the 24-item Dysfunctional Attitude Scale
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- Journal:
- Acta Neuropsychiatrica / Volume 19 / Issue 6 / December 2007
- Published online by Cambridge University Press:
- 24 June 2014, pp. 362-367
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Ozone-Based Atomic Layer Deposition of HfO2 and HfxSi1-xO2 and Film Characterization
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- Journal:
- MRS Online Proceedings Library Archive / Volume 811 / 2004
- Published online by Cambridge University Press:
- 28 July 2011, D7.4
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- 2004
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Stacked Metal Layers as Gates for MOSFET Threshold Voltage Control
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- Journal:
- MRS Online Proceedings Library Archive / Volume 765 / 2003
- Published online by Cambridge University Press:
- 01 February 2011, D1.4
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- 2003
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Stability Improvement of Nickel Silicide with Co Interlayer on Si, Polysilicon and SiGe
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- Journal:
- MRS Online Proceedings Library Archive / Volume 670 / 2001
- Published online by Cambridge University Press:
- 21 March 2011, K6.9
- Print publication:
- 2001
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Zr Oxide Based Gate Dielectrics with Equivalent SiO2 Thickness of Less than 1.0 nm and Device Integration with Pt Gate Electrode
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- Journal:
- MRS Online Proceedings Library Archive / Volume 611 / 2000
- Published online by Cambridge University Press:
- 14 March 2011, C2.9.1
- Print publication:
- 2000
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Highly Stable Ir-Ta-O Electrode for Ferroelectric Material Deposition
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- Journal:
- MRS Online Proceedings Library Archive / Volume 655 / 2000
- Published online by Cambridge University Press:
- 21 March 2011, CC2.3.1
- Print publication:
- 2000
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Thermal Stability of Ir/TaN Electrode/Barrier on Thin Gate Oxide for MFMOS one Transistor Memory Application
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- Journal:
- MRS Online Proceedings Library Archive / Volume 596 / 1999
- Published online by Cambridge University Press:
- 10 February 2011, 67
- Print publication:
- 1999
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Ultrathin Gate Oxides with Shallow Nitrogen Implants as Effective Barriers to Boron Diffusion
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- Journal:
- MRS Online Proceedings Library Archive / Volume 567 / 1999
- Published online by Cambridge University Press:
- 10 February 2011, 39
- Print publication:
- 1999
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Deposition and Treatment of TiO2 as an Alternative for Ultrathin Gate Dielectrics
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- Journal:
- MRS Online Proceedings Library Archive / Volume 567 / 1999
- Published online by Cambridge University Press:
- 10 February 2011, 355
- Print publication:
- 1999
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