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Physics-Based Diffusion Simulations for Preamorphized Ultrashallow Junctions
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- Journal:
- MRS Online Proceedings Library Archive / Volume 765 / 2003
- Published online by Cambridge University Press:
- 01 February 2011, D6.8
- Print publication:
- 2003
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Calibration of the Au Labeling Technique to Measure Vacancy Defects in Si
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- Journal:
- MRS Online Proceedings Library Archive / Volume 610 / 2000
- Published online by Cambridge University Press:
- 17 March 2011, B9.2
- Print publication:
- 2000
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Enhanced Diffusion of Dopants in Vacancy Supersaturation Produced by MeV Implantation
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- Journal:
- MRS Online Proceedings Library Archive / Volume 469 / 1997
- Published online by Cambridge University Press:
- 15 February 2011, 303
- Print publication:
- 1997
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