8 results
Kinetics and Microstructure of Transiently Annealed Implanted Polycrystalline Silicon Layers
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- Journal:
- MRS Online Proceedings Library Archive / Volume 157 / 1989
- Published online by Cambridge University Press:
- 25 February 2011, 647
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- 1989
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Improvements in Zone Melt Recrystallized Soi Layers by the Use of Selective Epitaxial Growth in the Seed Windows.
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- Journal:
- MRS Online Proceedings Library Archive / Volume 107 / 1987
- Published online by Cambridge University Press:
- 28 February 2011, 189
- Print publication:
- 1987
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TEM and SEM Studies of Multiple Silicon on Insulator Films for Three Dimensional Circuits.
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- Journal:
- MRS Online Proceedings Library Archive / Volume 107 / 1987
- Published online by Cambridge University Press:
- 28 February 2011, 235
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- 1987
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Electron Beam Processing of Semiconductors
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- Journal:
- MRS Online Proceedings Library Archive / Volume 13 / 1982
- Published online by Cambridge University Press:
- 15 February 2011, 653
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- 1982
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Characteristics of Recrystallised Polysilicon on SiO2 Produced by Dual Electron Beam Processing
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- Journal:
- MRS Online Proceedings Library Archive / Volume 13 / 1982
- Published online by Cambridge University Press:
- 15 February 2011, 563
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- 1982
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Dual Electron Beam Processing System for Semiconductor Materials
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- Journal:
- MRS Online Proceedings Library Archive / Volume 4 / 1981
- Published online by Cambridge University Press:
- 15 February 2011, 783
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- 1981
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Scanning E-Beam Annealing of Mos Devices
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1 / 1980
- Published online by Cambridge University Press:
- 15 February 2011, 383
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- 1980
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Multiple-Scan E-Beam Method Applied to a Range of Semiconducting Materials
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1 / 1980
- Published online by Cambridge University Press:
- 15 February 2011, 201
- Print publication:
- 1980
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