3 results
Relationship between Interfacial Roughness and Dielectric Reliability for Silicon Oxynitride Gate Dielectrics Processed with Nitric Oxide
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 567 / 1999
- Published online by Cambridge University Press:
- 10 February 2011, 289
- Print publication:
- 1999
-
- Article
- Export citation
Minimization of Interfacial Microroughness for 13–60 Å Ultrathin Gate Oxides
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 477 / 1997
- Published online by Cambridge University Press:
- 10 February 2011, 203
- Print publication:
- 1997
-
- Article
- Export citation
Effect of Hot Water Exposure on Bare Silicon Surfaces in Mos Processing
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 315 / 1993
- Published online by Cambridge University Press:
- 21 February 2011, 485
- Print publication:
- 1993
-
- Article
- Export citation