7 results
Reaction Kinetics of Sputter-Deposited Ti On SiO2 Substrates during Rapid Thermal Annealing
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- Journal:
- MRS Online Proceedings Library Archive / Volume 146 / 1989
- Published online by Cambridge University Press:
- 25 February 2011, 255
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- 1989
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Optimization of a Tin/TiSi2 p+ Diffusion Barrier Process
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- Journal:
- MRS Online Proceedings Library Archive / Volume 146 / 1989
- Published online by Cambridge University Press:
- 25 February 2011, 217
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- 1989
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Rapid Thermal Nitridation of Thin Oxides
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- Journal:
- MRS Online Proceedings Library Archive / Volume 92 / 1987
- Published online by Cambridge University Press:
- 28 February 2011, 121
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- 1987
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Effects of Rapid Thermal Processing on Thermal Oxides of Silicon#
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- Journal:
- MRS Online Proceedings Library Archive / Volume 71 / 1986
- Published online by Cambridge University Press:
- 28 February 2011, 449
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- 1986
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A Novel Silicided Shallow Junction Technology for Cmos VLSI
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- Journal:
- MRS Online Proceedings Library Archive / Volume 71 / 1986
- Published online by Cambridge University Press:
- 28 February 2011, 379
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- 1986
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Temperature Characterization of Pulsed Laser Annealing of Semiconductors
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- Journal:
- MRS Online Proceedings Library Archive / Volume 13 / 1982
- Published online by Cambridge University Press:
- 15 February 2011, 111
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- 1982
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Rapid Thermal Annealing of Composite TaSi2/n+ Poly-Si Silicide Films
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- Journal:
- MRS Online Proceedings Library Archive / Volume 23 / 1983
- Published online by Cambridge University Press:
- 22 February 2011, 733
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- 1983
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