Research Article
Amorphous Silicon Tfts and Flat Panel Displays
- Published online by Cambridge University Press: 10 February 2011, 3
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High Deposition Rate a-Si:H for the Flat Panel Display Industry
- Published online by Cambridge University Press: 10 February 2011, 9
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Surface Roughness of Silicon-Nitride Gate Insulators Deposited in a 40-MHZ Glow Discharge
- Published online by Cambridge University Press: 10 February 2011, 19
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A Novel Device Structure for High Voltage, High Performance Amorphous Silicon Thin-Film Transistors
- Published online by Cambridge University Press: 10 February 2011, 25
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Hot-Wire Deposited Amorphous Silicon Thin-Film Transistors
- Published online by Cambridge University Press: 10 February 2011, 31
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Nanostructure and Electrical Properties of Anodized Al Gate Insulators for Thin-Film Transistors
- Published online by Cambridge University Press: 10 February 2011, 37
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High-Rate Deposited Amorphous Silicon Nitride for the Hydrogenated Amorphous Silicon Thin-Film Transistor Structures
- Published online by Cambridge University Press: 10 February 2011, 43
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An Amorphous Silicon Thin Film Transistor Fabricated at 125°C by dc Reactive Magnetron Sputtering
- Published online by Cambridge University Press: 10 February 2011, 53
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Improved a-Si:H TFT Performance Using a-SixN1-x / a-SixC1-x Stack Dielectrics
- Published online by Cambridge University Press: 10 February 2011, 59
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Amorphous Silicon TFTs on Steel-Foil Substrates
- Published online by Cambridge University Press: 10 February 2011, 65
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a-Si:H TFTs Patterned Using Laser-Printed Toner
- Published online by Cambridge University Press: 10 February 2011, 71
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Influence Of The Density of States and Series Resistance on the Field-Effect Activation Energy in a-Si:H TFT
- Published online by Cambridge University Press: 10 February 2011, 77
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Investigation of the off-current in amorphous silicon thin film transistors for SiO2 and SiNx. gate insulators
- Published online by Cambridge University Press: 10 February 2011, 85
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Physics of Below Threshold Current Distribution in a-Si:H TFTs
- Published online by Cambridge University Press: 10 February 2011, 91
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Energy Levels of Defects in a-Si:H From Optical and Electrical Characteristics
- Published online by Cambridge University Press: 10 February 2011, 97
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Low Temperature Growth of Nanocrystalline Silicon From SiF4 + SiH4
- Published online by Cambridge University Press: 10 February 2011, 103
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Hydrogen Behavior in PECVD Nitride by SiH4 & ND3 During RTA
- Published online by Cambridge University Press: 10 February 2011, 109
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Characteristics of XeCI Excimer-Laser Annealed Insulator
- Published online by Cambridge University Press: 10 February 2011, 115
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Material Properties of Sipos Films Prepared by XeCl Excimer Laser Annealing of a-Si:Nx Films
- Published online by Cambridge University Press: 10 February 2011, 119
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Low Temperature Polysilicon Materials and Devices
- Published online by Cambridge University Press: 10 February 2011, 127
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