Research Article
Megasonic Irradiation Induced Chemical Reaction in the Solution for Silicon Wafer Cleaning
- Published online by Cambridge University Press: 10 February 2011, 3
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Practical considerations in Megasonic Wafer Cleaning
- Published online by Cambridge University Press: 10 February 2011, 15
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Particulate Removal from Silicon Substrates in Megasonic-Assisted Dilute SC1 Chemistry
- Published online by Cambridge University Press: 10 February 2011, 21
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SI3N4 Particle Removal Efficiency Study
- Published online by Cambridge University Press: 10 February 2011, 27
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Advanced Alkali Cleaning Solution for Simplification of Semiconductor Cleaning Process
- Published online by Cambridge University Press: 10 February 2011, 35
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The Role of HO2 − in SC-1 Cleaning Solutions
- Published online by Cambridge University Press: 10 February 2011, 47
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The Adsorption-Desorption of Cations at the Silica-Water its Implication in Wafer-Cleaning Efficacy
- Published online by Cambridge University Press: 10 February 2011, 57
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In-homogeneous precipitation of Iron from SC1 Solutions
- Published online by Cambridge University Press: 10 February 2011, 63
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Surface Treatment with UV-Excited Radicals for Highly-Reliable Gate Dielectrics
- Published online by Cambridge University Press: 10 February 2011, 71
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Impact of Metal Contamination of 7.0nm Gate Oxides on Various Substrate Materials
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Effect of Cl in Gate Oxidation
- Published online by Cambridge University Press: 10 February 2011, 89
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Organic Contamination of Silicon Wafer in Clean Room Air and its Impact to Gate Oxide Integrity
- Published online by Cambridge University Press: 10 February 2011, 101
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The Integration of Interlayer Dielectric Deposition and Chemical Mechanical Polishing
- Published online by Cambridge University Press: 10 February 2011, 109
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Use of Malonic Acid in Chemical-Mechanical Polishing ( CMP ) of Tungsten
- Published online by Cambridge University Press: 10 February 2011, 115
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Surface Characteristics, Etching Behaviors and Chemicalmechanical Polishing of Aluminum Alloy thin Films
- Published online by Cambridge University Press: 10 February 2011, 125
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Planarization of Gratings using Magnetorheological Finishing
- Published online by Cambridge University Press: 10 February 2011, 131
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Chemical Mechanical Cleaning for Post-CMP Applications: Defects and Metals Results
- Published online by Cambridge University Press: 10 February 2011, 137
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‘Back end’ Chemical Cleaning in integrated Circuit Fabrication: a Tutorial
- Published online by Cambridge University Press: 10 February 2011, 145
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Post Metal Etch Treatment for Submicron Applications
- Published online by Cambridge University Press: 10 February 2011, 159
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Etching Characteristics During Cleaning of Silicon Surfaces by NF3-added Hydrogen and Water-Vapor Plasma Downstream Treatment
- Published online by Cambridge University Press: 10 February 2011, 167
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