11 results
Analytical TEM Characterization of Source/Drain Contacts in Advanced Semiconductor Devices
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- Journal:
- Microscopy and Microanalysis / Volume 24 / Issue S1 / August 2018
- Published online by Cambridge University Press:
- 01 August 2018, pp. 8-9
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- August 2018
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Electron Differential Phase Microscopy with an A-B Effect Phase Plate
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- Journal:
- Microscopy and Microanalysis / Volume 21 / Issue S3 / August 2015
- Published online by Cambridge University Press:
- 23 September 2015, pp. 1945-1946
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- August 2015
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Passage of Single Hydrocarbon Chains Through a Defect of Carbon Nanotube
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- Journal:
- Microscopy and Microanalysis / Volume 15 / Issue S2 / July 2009
- Published online by Cambridge University Press:
- 26 July 2009, pp. 1170-1171
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- July 2009
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Ultrathin Silicon Oxide and Nitride – Silicon Interface States
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- Journal:
- MRS Online Proceedings Library Archive / Volume 567 / 1999
- Published online by Cambridge University Press:
- 10 February 2011, 549
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- 1999
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The Effects of Interfacial Suboxide Transition Regions on Direct Tunneling in Oxide and Stacked Oxide-Nitride Gate Dielectrics
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- Journal:
- MRS Online Proceedings Library Archive / Volume 567 / 1999
- Published online by Cambridge University Press:
- 10 February 2011, 241
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- 1999
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Cathodoluminescence Studies of Si-Sio2 Interfaces Prepared by Plasma-Assisted Oxidation and Subjected to Post-Oxidation Rapid Thermal Annealing
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- Journal:
- MRS Online Proceedings Library Archive / Volume 525 / 1998
- Published online by Cambridge University Press:
- 10 February 2011, 151
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- 1998
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Bonded-H in Gate Dielectrics Deposited by Plasma Assisted Chemical Vapor Deposition and Subjected to Rapid Thermal Annealing
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- Journal:
- MRS Online Proceedings Library Archive / Volume 429 / 1996
- Published online by Cambridge University Press:
- 10 February 2011, 233
- Print publication:
- 1996
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Reaction Pathways for Nitrogen Incorporation at Si-SiO2 Interfaces
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- Journal:
- MRS Online Proceedings Library Archive / Volume 446 / 1996
- Published online by Cambridge University Press:
- 10 February 2011, 267
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- 1996
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Controlled Incorporation of Nitrogen at The Top Surface of Silicon Oxide Gate Dielectrics
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- Journal:
- MRS Online Proceedings Library Archive / Volume 446 / 1996
- Published online by Cambridge University Press:
- 10 February 2011, 103
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- 1996
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Integrated Processing of Silicon Oxynitride Alloy Dielectrics by Plasma-Assisted Oxidation, Chemical Vapor Deposition, and On-Line Rapid Thermal Annealing
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- Journal:
- MRS Online Proceedings Library Archive / Volume 387 / 1995
- Published online by Cambridge University Press:
- 15 February 2011, 213
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- 1995
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Silicon Oxynitride and Oxide-Nitride-Oxide Gate Dielectrics by Combined Plasma-Rapid Thermal Processing
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- Journal:
- MRS Online Proceedings Library Archive / Volume 342 / 1994
- Published online by Cambridge University Press:
- 22 February 2011, 169
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- 1994
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