10 results
The Influence of Low Temperature Pre-Annealing on the Defect Removal and the Reduction of Junction Depth in Excimer Laser Annealing
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- Journal:
- MRS Online Proceedings Library Archive / Volume 717 / 2002
- Published online by Cambridge University Press:
- 01 February 2011, C1.12
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- 2002
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Electrical Characteristics of TaOxNy/ZrSixOy Stack Gate Dielectric for MOS Device Applications
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- Journal:
- MRS Online Proceedings Library Archive / Volume 670 / 2001
- Published online by Cambridge University Press:
- 21 March 2011, K4.6
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- 2001
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Ultra - Shallow p+/n Junction Formed by Plasma Ion Implantation
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- Journal:
- MRS Online Proceedings Library Archive / Volume 610 / 2000
- Published online by Cambridge University Press:
- 17 March 2011, B3.7
- Print publication:
- 2000
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Ultra-thin Gate Oxide Prepared by Nitridation in ND3 for MOS Device Applications
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- Journal:
- MRS Online Proceedings Library Archive / Volume 611 / 2000
- Published online by Cambridge University Press:
- 14 March 2011, C2.4.1
- Print publication:
- 2000
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Charging Effect in Amorphous Silicon Quantum Dots Embedded in Silicon Nitride
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- Journal:
- MRS Online Proceedings Library Archive / Volume 638 / 2000
- Published online by Cambridge University Press:
- 17 March 2011, F5.14.1
- Print publication:
- 2000
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Electrical Characteristics of TaOxNy for High-k MOS Gate Dielectric Applications
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- Journal:
- MRS Online Proceedings Library Archive / Volume 611 / 2000
- Published online by Cambridge University Press:
- 14 March 2011, C1.8.1
- Print publication:
- 2000
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Ultrathin Gate Oxide Prepared by Oxidation in D2O for Mos Device Applications
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- Journal:
- MRS Online Proceedings Library Archive / Volume 567 / 1999
- Published online by Cambridge University Press:
- 10 February 2011, 45
- Print publication:
- 1999
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Comparison of Ultra-low-energy Ion Implantation of Boron and BF2
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- Journal:
- MRS Online Proceedings Library Archive / Volume 568 / 1999
- Published online by Cambridge University Press:
- 10 February 2011, 71
- Print publication:
- 1999
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Atomie Force Microscope Study of Two-Dimensional Dopant Delineation by Selective Chemical Etching
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- Journal:
- MRS Online Proceedings Library Archive / Volume 490 / 1997
- Published online by Cambridge University Press:
- 10 February 2011, 53
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- 1997
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Defect Generation During Epitaxial Growth of CoSi2 on Miniature Sized (100) Si Substrate and its Effect on Electrical Properties
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- Journal:
- MRS Online Proceedings Library Archive / Volume 402 / 1995
- Published online by Cambridge University Press:
- 15 February 2011, 167
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- 1995
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