6 results
Self-Aligned Epitaxial Cosi2 Formation From Multilayer Co/Ti-Si(100) by a Two-Step Rta Process
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 303 / 1993
- Published online by Cambridge University Press:
- 21 February 2011, 69
- Print publication:
- 1993
-
- Article
- Export citation
Addendum: “Partial agglomeration during Co silicide film formation” [J. Mater. Res. 7, 269 (1992)]
-
- Journal:
- Journal of Materials Research / Volume 7 / Issue 11 / November 1992
- Published online by Cambridge University Press:
- 31 January 2011, p. 3159
- Print publication:
- November 1992
-
- Article
- Export citation
Partial agglomeration during Co silicide film formation
-
- Journal:
- Journal of Materials Research / Volume 7 / Issue 2 / February 1992
- Published online by Cambridge University Press:
- 31 January 2011, pp. 269-272
- Print publication:
- February 1992
-
- Article
- Export citation
Tisi2 Thin Films Formed on Crystalline and Amorphous Silicon
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 181 / 1990
- Published online by Cambridge University Press:
- 25 February 2011, 167
- Print publication:
- 1990
-
- Article
- Export citation
TiSi2 Thin Films Formed on Crystalline and Amorphous Silicon
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 182 / 1990
- Published online by Cambridge University Press:
- 21 February 2011, 65
- Print publication:
- 1990
-
- Article
- Export citation
Silicon Consumption During Self-Aligned Titanium Suicide Formation on Shallow Junctions
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 160 / 1989
- Published online by Cambridge University Press:
- 28 February 2011, 299
- Print publication:
- 1989
-
- Article
- Export citation