Hostname: page-component-848d4c4894-tn8tq Total loading time: 0 Render date: 2024-07-08T03:26:07.998Z Has data issue: false hasContentIssue false
  • English
  • Français

Addendum: “Partial agglomeration during Co silicide film formation” [J. Mater. Res. 7, 269 (1992)]

Published online by Cambridge University Press:  31 January 2011

Z.G. Xiao ,
G.A. Rozgonyi ,
C.A. Canovai  and
C.M. Osburn
Z.G. Xiao
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, Raleigh, North Carolina 27695-7916
G.A. Rozgonyi
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, Raleigh, North Carolina 27695-7916
C.A. Canovai
Affiliation:
Department of Electrical and Computer Engineering, North Carolina State University, Raleigh, North Carolina 27695-7911
C.M. Osburn
Affiliation:
Department of Electrical and Computer Engineering, North Carolina State University, Raleigh, North Carolina 27695-7911
Get access

Abstract

An abstract is not available for this content so a preview has been provided. Please use the Get access link above for information on how to access this content.
Image of the first page of this content. For PDF version, please use the ‘Save PDF’ preceeding this image.'
Type
Addendum
Information
Journal of Materials Research , Volume 7 , Issue 11 , November 1992 , pp. 3159
Copyright
Copyright © Materials Research Society 1992

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1Beyers, Robert, Ph.D. Thesis, Stanford University (1989),Google Scholar
2Srolovitz, D. J. and Safran, S. A., J. Appl. Phys. 60, 247 (1986), andGoogle Scholar
3Xiao, Z. G., Rozgonyi, G. A., Jiang, H., Honey-cutt, J., Osburn, C. M., and McGuire, G., in Extended Abstracts, Vol. 90–1 (1990) of the Electrochem. Soc, Pennington, NJ, p. 258.”Google Scholar