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SEM EDS Mapping of Ultra-Low Energy X-rays Using a Silicon Nitride Window Silicon Drift Detector

Published online by Cambridge University Press:  22 July 2022

Shangshang Mu ,
Jens Rafaelsen  and
Masanobu Kawabata
Shangshang Mu*
Affiliation:
EDAX LLC., Ametek Materials Analysis Division, Pleasanton, CA, United States
Jens Rafaelsen
Affiliation:
EDAX LLC., Ametek Materials Analysis Division, Pleasanton, CA, United States
Masanobu Kawabata
Affiliation:
EDAX LLC., Ametek Materials Analysis Division, Pleasanton, CA, United States
*
*Corresponding author: shangshang.mu@ametek.com

Abstract

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Type
Quantitative and Qualitative Mapping of Materials
Information
Microscopy and Microanalysis , Volume 28 , Supplement S1 , August 2022 , pp. 572 - 573
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Copyright
Copyright © Microscopy Society of America 2022

References

NWM Ritchie, NIST DTSA-II software, https://cstl.nist.gov/div837/837.02/epq/dtsa2/ (accessed February 22, 2022).Google Scholar