Hostname: page-component-7479d7b7d-jwnkl Total loading time: 0 Render date: 2024-07-11T19:01:55.025Z Has data issue: false hasContentIssue false
  • English
  • Français

High throughput Imaging and Increasing Resolution of X-ray Imaging at High Acceleration Voltages

Published online by Cambridge University Press:  22 July 2022

Emil Espes  and
Anasuya Adibhatla
Emil Espes
Affiliation:
Excillum AB, Kista, Sweden
Anasuya Adibhatla*
Affiliation:
Excillum Inc, Naperville, IL, USA
*
*Corresponding author: anasuya.adibhatla@excillum.com

Abstract

An abstract is not available for this content so a preview has been provided. As you have access to this content, a full PDF is available via the ‘Save PDF’ action button.
Image of the first page of this content. For PDF version, please use the ‘Save PDF’ preceeding this image.'
Type
Advanced 3D Imaging and Analysis Methods for New Opportunities in Material Science
Information
Microscopy and Microanalysis , Volume 28 , Supplement S1 , August 2022 , pp. 228 - 230
Check for updates
Copyright
Copyright © Microscopy Society of America 2022

References

Lapedus, M., Can We Measure Next-Gen FinFETs? Semiconductor engineering, Nov 21 2016Google Scholar
Kline, R. J., Sunday, D. F., Windover, D. and Wu, W., ‘Bringing CD-SAXS to the Fab’, SEMICON West 2014, 2014.Google Scholar
Bowen, D. and Tanner, B., X-ray metrology in semiconductor manufacturing. Boca Raton: CRC/Taylor & Francis, 2006.Google Scholar
Thompson, W. D., Joseph Kline, R., and Sorkhabi, Osman, Characterization of a Lab Based CD-SAXS Tool, Frontiers of characterization and metrology for nanoelectronics (FCMN) Monterey, 2017.Google Scholar
Bowen, D. and Tanner, B., X-ray metrology in semiconductor manufacturing. Boca Raton: CRC/Taylor & Francis, 2006.Google Scholar
Schulze, A., X-Ray Metrology for The Semiconductor Industry, Int. Workshop on Compact EUV and X-ray Light Sources 2015.Google Scholar
Beetz, T., 'High-resolution X-ray Tomography Imaging Systems', CHESS Users’ Meeting Ithaca, NY, 2008.Google Scholar
Gullikson, E., Filter transmission, http://henke.lbl.gov/optical_constants/filter2.html, visited on 2015-03-24.Google Scholar
Rudati, J. - Rapid integrated circuit inspection for reliability and security inspection, International Conference X-ray Microscopy XRM, Oxford, 2016.Google Scholar
Patt, M., HAXPES-Lab: The first laboratory based hard X-ray photoelectron spectroscopy system using a 9.25 keV X-ray source, ECOSS, Grenoble, 2016.Google Scholar