6 results
Integration of a Polymer Etch Stop Layer in a Porous Low K MLM Structure
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- Journal:
- MRS Online Proceedings Library Archive / Volume 863 / 2005
- Published online by Cambridge University Press:
- 01 February 2011, B2.11
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- 2005
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Pore Structure and Integration Performance of a Porous CVD Ultra Low k Dielectric
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- Journal:
- MRS Online Proceedings Library Archive / Volume 863 / 2005
- Published online by Cambridge University Press:
- 01 February 2011, B3.1
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- 2005
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Scanning Near-Field Microwave Probe for In-line Metrology of Low-K Dielectrics
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- Journal:
- MRS Online Proceedings Library Archive / Volume 812 / 2004
- Published online by Cambridge University Press:
- 17 March 2011, F5.11
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- 2004
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Ultra Low-K Inorganic Silsesquioxane Films with Tunable Electrical and Mechanical Properties
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- Journal:
- MRS Online Proceedings Library Archive / Volume 612 / 2000
- Published online by Cambridge University Press:
- 17 March 2011, D5.18.1
- Print publication:
- 2000
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Atomic Structure Impacts on Dielectric and Mechanical Properties of Hydrogen-Silsesquioxane During Thermal Processing
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- Journal:
- MRS Online Proceedings Library Archive / Volume 565 / 1999
- Published online by Cambridge University Press:
- 10 February 2011, 267
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- 1999
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Plasma Etching of Hydrogen-Silsesquioxane
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- Journal:
- MRS Online Proceedings Library Archive / Volume 511 / 1998
- Published online by Cambridge University Press:
- 10 February 2011, 253
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- 1998
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