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Pore Structure and Integration Performance of a Porous CVD Ultra Low k Dielectric
Published online by Cambridge University Press: 01 February 2011
Abstract
A porous ultra low k PECVD dielectric has been evaluated at SEMATECH for 45 nm and beyond technology node applications. Material structure, integration performance, and electrical characteristics were investigated in a one level metal single damascene integrated structure.
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- Research Article
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- Copyright © Materials Research Society 2005
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