12 results
Prevalence, incidence and comparative meta-analysis of all-cause and specific-cause cardiovascular disease in patients with serious mental illness
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- Journal:
- European Psychiatry / Volume 41 / Issue S1 / April 2017
- Published online by Cambridge University Press:
- 23 March 2020, pp. S319-S320
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Thermoelectric Properties of p and n-type Nanocrystalline Silicon Nanowires with High Doping Levels
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1408 / 2012
- Published online by Cambridge University Press:
- 11 January 2012, mrsf11-1408-bb11-04
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- 2012
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Indium in silicon: a study on diffusion and electrical activation.
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- Journal:
- MRS Online Proceedings Library Archive / Volume 765 / 2003
- Published online by Cambridge University Press:
- 01 February 2011, D6.13
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- 2003
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Transient Diffusion Effects of Sb and B In Si Induced by Medium- and High-Energy Implants of Si+ and As+ Ions
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- Journal:
- MRS Online Proceedings Library Archive / Volume 568 / 1999
- Published online by Cambridge University Press:
- 10 February 2011, 193
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- 1999
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Formation of Counter Doped Shallow Junctions by Boron and Antimony Implantation and Codiffusion in Silicon
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- Journal:
- MRS Online Proceedings Library Archive / Volume 469 / 1997
- Published online by Cambridge University Press:
- 15 February 2011, 329
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- 1997
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Effects of Interstitial Clustering on Transient Enhanced Diffusion of Boron in Silicon
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- Journal:
- MRS Online Proceedings Library Archive / Volume 439 / 1996
- Published online by Cambridge University Press:
- 15 February 2011, 65
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- 1996
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Effects of Interstitial Clustering on Transient Enhanced Diffusion of Boron in Silicon
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- Journal:
- MRS Online Proceedings Library Archive / Volume 438 / 1996
- Published online by Cambridge University Press:
- 03 September 2012, 95
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- 1996
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Experimental Results and Modeling of the Codiffusion of Donors and Acceptors in Si
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- Journal:
- MRS Online Proceedings Library Archive / Volume 389 / 1995
- Published online by Cambridge University Press:
- 15 February 2011, 65
- Print publication:
- 1995
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Boron and antimony codiffusion in silicon
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- Journal:
- Journal of Materials Research / Volume 6 / Issue 11 / November 1991
- Published online by Cambridge University Press:
- 31 January 2011, pp. 2353-2361
- Print publication:
- November 1991
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As and B Ion Implantation Through Mo and into Mo-Silicide Layers for Shallow Junction Formation
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- Journal:
- MRS Online Proceedings Library Archive / Volume 157 / 1989
- Published online by Cambridge University Press:
- 25 February 2011, 751
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- 1989
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Radiation Damage Induced Transient Enhanced Diffusion of Dopants in Silicon
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- Journal:
- MRS Online Proceedings Library Archive / Volume 74 / 1986
- Published online by Cambridge University Press:
- 28 February 2011, 505
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- 1986
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Characterization of Al-Si Ohmic Contacts Obtained on Shallow Junctions by Laser and Electron Beam Annealing
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1 / 1980
- Published online by Cambridge University Press:
- 15 February 2011, 329
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- 1980
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