9 results
High Performance High Dielectric Constant Films Deposited by Dual Spectral Source Rapid Isothermal Assisted Metalorganic Chemical Vapor Deposition (MOCVD)
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- Journal:
- MRS Online Proceedings Library Archive / Volume 470 / 1997
- Published online by Cambridge University Press:
- 10 February 2011, 133
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- 1997
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Integrated Rapid Thermal CVD Processing Solutions for 0.18–0.25μm Technologies
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- Journal:
- MRS Online Proceedings Library Archive / Volume 470 / 1997
- Published online by Cambridge University Press:
- 10 February 2011, 215
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- 1997
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Low Thermal Budget Processing Of Organic Dielectrics
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- Journal:
- MRS Online Proceedings Library Archive / Volume 381 / 1995
- Published online by Cambridge University Press:
- 15 February 2011, 117
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- 1995
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Excimer Laser Annealing of Amorphous Silicon Films
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- Journal:
- MRS Online Proceedings Library Archive / Volume 336 / 1994
- Published online by Cambridge University Press:
- 16 February 2011, 61
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- 1994
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Analysis of Critical Parameters Affecting the Temperature Uniformity During Rapid Thermal Processing
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- Journal:
- MRS Online Proceedings Library Archive / Volume 342 / 1994
- Published online by Cambridge University Press:
- 22 February 2011, 389
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- 1994
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Ultrathin Gate and Capacitor Dielectric Formation Using Single- Wafer Processing
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- Journal:
- MRS Online Proceedings Library Archive / Volume 303 / 1993
- Published online by Cambridge University Press:
- 21 February 2011, 401
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- 1993
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Stress and Warpage Studies of Silicon Based Plain and Patterned Films During Rapid Thermal Processing (RTP)
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- Journal:
- MRS Online Proceedings Library Archive / Volume 303 / 1993
- Published online by Cambridge University Press:
- 21 February 2011, 189
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- 1993
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Gate Oxide Integrity as Affected by Hf Last Wafer Treatments and Passivating Techniques
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- Journal:
- MRS Online Proceedings Library Archive / Volume 303 / 1993
- Published online by Cambridge University Press:
- 21 February 2011, 303
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- 1993
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Role of Photoeffects in Integrated Rapid Isothermal Processing
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- Journal:
- MRS Online Proceedings Library Archive / Volume 224 / 1991
- Published online by Cambridge University Press:
- 28 February 2011, 197
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- 1991
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