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We developed a variable-temperature scanning microwave microscope (VT-SμM) that can perform high-throughput materials characterization in the temperature range between 4K and room temperature. As a sensor probe we used a high-Q coaxial cavity resonator, which was mounted on the low-temperature stage to allow variable-temperature measurements. We carried out systematic studies on the thermal degradation of the conducting polymers using the combinatorial libraries of polyaniline and polythiophene thin films, which showed rapid decrease of conductivity above 300C and 250C, respectively. The low-temperature performance of the VT-SμM was demonstrated by the measurement of composition-spread Nd1-xSrxMnO3 thin film, for which we succeeded in detecting the clear metal-insulator transition at 100K. We also propose a simple and easy method for the quantitative analysis of conductive thin films, by using the standard composition-spread thin films of Ti1-xNbxO2.
We developed a scanning microwave microscope (SμM) designed for characterizing local electric properties at low temperatures. A high-Q λ/4coaxial cavity was used as a sensor probe, which can detect the change of quality factor due to the tip-sample interaction with enough accuracy. From the measurements of combinatorial samples, it was demonstrated that this SμM system has enough performance for high-throughput characterization of sample conductance under variable temperature conditions.
A scanning microwave microscope (Sm M) for high-throughput characterization of combinatorial dielectric materials has been developed using a lumped constant resonator probe. The probe consists of a microwave oscillator module equipped with a thin conducting needle and an outer conductor ring, which detects the dielectric constant of the sample just beneath the needle as a frequency shift of the resonator. The quantitative analysis of the dielectric constant for the bulk and the thin-film samples was carried out based on the measurement of gap-length dependence of the frequency shift. The analysis method was successfully applied to the characterization of composition-spread BaxSr1-xTiO3 thin film sample. The evaluation of far-field contribution to the frequency shift was found to be crucial for the accurate determination of dielectric constant especially in the characterization of combinatorial thin films.
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