10 results
External rf substrate biasing during a-Si:H film growth using the expanding thermal plasma technique
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- Journal:
- MRS Online Proceedings Library Archive / Volume 808 / 2004
- Published online by Cambridge University Press:
- 21 March 2011, A9.21
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- 2004
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Thin Film Cavity Ringdown Spectroscopy and Second Harmonic Generation on Thin a-Si:H Films
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- MRS Online Proceedings Library Archive / Volume 762 / 2003
- Published online by Cambridge University Press:
- 01 February 2011, A19.8
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- 2003
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On the Role of Surface Diffusion and Its Relation to the Hydrogen Incorporation During Hydrogenated Amorphous Silicon Growth
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- Journal:
- MRS Online Proceedings Library Archive / Volume 762 / 2003
- Published online by Cambridge University Press:
- 01 February 2011, A10.3
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- 2003
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On the Surface Roughness Evolution During a-Si:H Growth
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- Journal:
- MRS Online Proceedings Library Archive / Volume 715 / 2002
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- 01 February 2011, A15.1
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- 2002
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Ex situ and in situ defect density measurements of a-Si:H by means of the cavity ring down absorption technique
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- Journal:
- MRS Online Proceedings Library Archive / Volume 664 / 2001
- Published online by Cambridge University Press:
- 17 March 2011, A22.4
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- 2001
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Material properties and growth process of microcrystalline silicon with growth rates in excess of 1 nm/s
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- MRS Online Proceedings Library Archive / Volume 664 / 2001
- Published online by Cambridge University Press:
- 17 March 2011, A4.2
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- 2001
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Surface roughness evolution of a-Si:H growth and its relation to the growth mechanism
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- Journal:
- MRS Online Proceedings Library Archive / Volume 609 / 2000
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- 17 March 2011, A7.6
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- 2000
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Relation between Growth Precursors and Film Properties for Plasma Deposition of a-Si:H at Rates up to 100 Å/s
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- Journal:
- MRS Online Proceedings Library Archive / Volume 609 / 2000
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- 17 March 2011, A4.2
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- 2000
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The Role of H in the Growth Mechanism of PECVD a-Si:H
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- MRS Online Proceedings Library Archive / Volume 557 / 1999
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- 15 February 2011, 13
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- 1999
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Remote Silane Plasma Chemistry Effects and their Correlation with a-Si:H Film Properties
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- Journal:
- MRS Online Proceedings Library Archive / Volume 557 / 1999
- Published online by Cambridge University Press:
- 15 February 2011, 25
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- 1999
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