4 results
A Calculation Method of the Deposition Profiles in Chemical Vapor Deposition Reactors Using Basis Functions
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 1024 / 2007
- Published online by Cambridge University Press:
- 01 February 2011, 1024-A06-13
- Print publication:
- 2007
-
- Article
- Export citation
An Autonomous and Intelligent System Using Mobile-Agent Software to Model the Calculation Processes of Film Deposition Simulators
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 1024 / 2007
- Published online by Cambridge University Press:
- 01 February 2011, 1024-A06-05
- Print publication:
- 2007
-
- Article
- Export citation
A Calculation Method of Deposition Profiles in Chemical Vapor Deposition Reactors Using Genetic Algorithms for The Automatic Modeling System of Reaction Mechanisms
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 894 / 2005
- Published online by Cambridge University Press:
- 26 February 2011, 0894-LL03-10
- Print publication:
- 2005
-
- Article
- Export citation
Automatic Reaction Modeling in Chemical Vapor Depositions Using Multiple Process Simulators
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 804 / 2003
- Published online by Cambridge University Press:
- 01 February 2011, JJ9.15
- Print publication:
- 2003
-
- Article
- Export citation