Hostname: page-component-848d4c4894-8kt4b Total loading time: 0 Render date: 2024-06-22T09:29:18.200Z Has data issue: false hasContentIssue false
  • English
  • Français

A Calculation Method of the Deposition Profiles in Chemical Vapor Deposition Reactors Using Basis Functions

Published online by Cambridge University Press:  01 February 2011

Takahiro Takahashi ,
Ken Kawamura  and
Yoshinori Ema
Takahiro Takahashi
Affiliation:
tttakah@ipc.shizuoka.ac.jp, Shizuoka University, Department of Electrical and Electronic Engineering, 3-5-1 Johoku, Naka-ku, Hamamatsu, 4328561, Japan
Ken Kawamura
Affiliation:
f0630108@ipc.shizuoka.ac.jp, Shizuoka University, Department of Electrical and Electronic Engineering, Faculty of Engineering, 3-5-1 Johoku, Naka-ku, Hamamatsu, 4328561, Japan
Yoshinori Ema
Affiliation:
teyema@ipc.shizuoka.ac.jp, Shizuoka University, Department of Electrical and Electronic Engineering, Faculty of Engineering, 3-5-1 Johoku, Naka-ku, Hamamatsu, 4328561, Japan
Get access

Abstract

In this paper, we introduced a novel calculation method to reproduce deposition profiles in various types of Chemical Vapor Deposition (CVD) reactors. Robust and accurate calculations along with reduced computing cost were achieved by the method. Boundary value problems for estimating diffusion-reaction equations by iterations of numerical integrations were changed into problems of finding the linear combinations consisted of a few "basis functions", which are inherent in the reactors. The coefficients of the linear combinations were optimized by Genetic Algorithms (GA). We could demonstrate the validity of the proposed method using various examples of the reaction mechanisms and conditions.

Keywords

chemical vapor deposition (CVD) (chemical reaction)simulationcombinatorial synthesis
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1024: Symposium A – Combinatorial Methods for High-Throughput Materials Science , 2007 , 1024-A06-13
Copyright
Copyright © Materials Research Society 2008

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Takahashi, T. and Ema, Y. in Combinatorial Methods and Informatics in Materials Science, edited by Fasolka, M. J., Wang, Q., Potyrailo, R.A., Chikyow, T., Schubert, U. S. and Korkin, A., (Mater. Res. Soc. Symp. Proc. 894, Warrendale, PA, 2006) pp. 345–350.Google Scholar
2. Takahashi, T., Funatsu, K. and Ema, Y., Meas. Sci. Technol. 16, 278 (2005).Google Scholar
3. Holland, J. H., fiAdaptation in natural and artificial systemsfl, University of Michigan Press (1975).Google Scholar
4. Wehrens, R. and Buydens, L.M.C., Tr. Anal. Chem. 17, 193 (1998).Google Scholar