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Practical Aspects of Forming Ultra-Shallow Junctions by Sub-keV Boron Implants
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- Journal:
- MRS Online Proceedings Library Archive / Volume 568 / 1999
- Published online by Cambridge University Press:
- 10 February 2011, 55
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- 1999
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Energetic Ion Beams in Semiconductor Processing: Summary of a Doe Panel Study
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- Journal:
- MRS Online Proceedings Library Archive / Volume 396 / 1995
- Published online by Cambridge University Press:
- 21 February 2011, 859
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- 1995
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Surface Modification of Bio-Active Ceramic (Artificial Bone) by Ion Implantation
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- Journal:
- MRS Online Proceedings Library Archive / Volume 252 / 1991
- Published online by Cambridge University Press:
- 15 February 2011, 23
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- 1991
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Epitaxial Al(110) Films Grown On Heavily-Doped Si(100) by Cluster Beam Deposition.
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- Journal:
- MRS Online Proceedings Library Archive / Volume 235 / 1991
- Published online by Cambridge University Press:
- 28 February 2011, 621
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- 1991
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Novel Paths for Nucleatton and Growth of Thin Films by Ionized Cluster Beam (ICB) Techniques: Atomic-Scale Observations
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- Journal:
- MRS Online Proceedings Library Archive / Volume 235 / 1991
- Published online by Cambridge University Press:
- 28 February 2011, 597
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- 1991
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Ultra-Pure Processing: a Key Challenge for Ion Implantation Processing for Fabrication of ULSI Devices
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- Journal:
- MRS Online Proceedings Library Archive / Volume 147 / 1989
- Published online by Cambridge University Press:
- 21 February 2011, 365
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- 1989
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Metallic Impurities and Dopant Cross-Contamination Effects in Ion Implanted Surfaces
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- Journal:
- MRS Online Proceedings Library Archive / Volume 45 / 1985
- Published online by Cambridge University Press:
- 25 February 2011, 381
- Print publication:
- 1985
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