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Novel Paths for Nucleatton and Growth of Thin Films by Ionized Cluster Beam (ICB) Techniques: Atomic-Scale Observations

Published online by Cambridge University Press:  28 February 2011

I. Yamada
Affiliation:
Ion Beam Engineering Experimental Laboratory, Kyoto University, Sakyo, Kyoto 606–01, JAPAN
T. Yamada
Affiliation:
Ion Beam Engineering Experimental Laboratory, Kyoto University, Sakyo, Kyoto 606–01, JAPAN
G. H. Takaoka
Affiliation:
Ion Beam Engineering Experimental Laboratory, Kyoto University, Sakyo, Kyoto 606–01, JAPAN
H. Usui
Affiliation:
Ion Beam Engineering Experimental Laboratory, Kyoto University, Sakyo, Kyoto 606–01, JAPAN
M. I. Current
Affiliation:
Ion Beam Engineering Experimental Laboratory, Kyoto University, Sakyo, Kyoto 606–01, JAPAN
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Abstract

Atomic-scale observations by STM and TEM of the early stages of film growth and recent studies of the detailed composition of beams from ICB sources have led to new understandings of origins of some of the extraordinary properties of thin films deposited by ICB methods. The presence of a small fraction of atoms in the form of large clusters initiates a novel sequence of film growth steps starting with the immediate formation of stable islands for film growth. The growth of films from cluster-initiated islands leads to fundamentally altered film properties (compared to atomic beam, MBE, deposition) such as the epitaxial alignment of metal/semiconductor/ceramic multilayers grown near room temperature.

Type
Research Article
Copyright
Copyright © Materials Research Society 1992

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References

REFERENCES

1. Yamada, I., Proc. ISIAT'90, Tokyo, (1990) 126.CrossRefGoogle Scholar
2. Yamada, I., Takoka, G.H., Usui, H., Koh, S.K., Mat. Res. Soc. Symp. Proc. 206(1991)383390.Google Scholar
3. Yamada, I., Usui, H., Takagi, T., J. Vac. Sci. Technol. A4 (1986) 722727.CrossRefGoogle Scholar
4. Yamada, I., Physica Scripta T35 (1991) 245250.CrossRefGoogle Scholar
5. Yamada, I., Applied Surface Science 43 (1989) 2331.Google Scholar
6. Brown, W.L., Jarrold, M.F., McEachern, R.L., Soznowski, M., Takaoka, G., Usui, H., Yamada, I., Nuc. Inst. Meth. B59–60(1991) 182189.CrossRefGoogle Scholar
7. Usui, H., Tanaka, M., Yamada, I., Takagi, T., Nuc. Inst. Meth. B37/38 (1989) 886890. Google Scholar
8. Yamada, I., Takoka, G.H., Usui, H., Koh, S.K., Sato, F., Yamda, T., Proc. ISIAT '91, Tokyo, (1991) 237240.Google Scholar
9. Yokoyama, S. and Okamoto, K., Ext. Abst. Int. Conf. on Solid State Devices and Materials, Yokohama, (1991)757758.Google Scholar
10. Zuhr, R.A., Haynes, T.E., Galloway, M.D., Tanaka, S., Yamada, A., Yamada, I., Nuc. Inst. Meth B59/60 (1991) 308311.CrossRefGoogle Scholar
11. Liu, J.C., Marwick, A.D., LeGoues, F.K., Phys. Rev. B44(1991)18611874.CrossRefGoogle Scholar
12. Yamada, I., Usui, H., Harumoto, H., Takagi, T., Mat. Res. Soc. Symp. Proc. 101(1988)172.Google Scholar
13. Yamada, I., Usui, H., Tanaka, S., Wada, S., Nuc. Inst. Meth B59/60 (1991) 302307 Google Scholar
14. Yamada, I. and Takagi, T., IEEE trans. Electron Dev. ED–34 (1987) 10181025.CrossRefGoogle Scholar
15. Hummel, R.E. and Yamada, I., Appl. Phys. Lett. 53(18) (1988) 17651767.Google Scholar
16. Dahmen, U. and Westmacott, K.H., Proc. Of ISIAT'90, Tokyo, (Vol. 2) (1990) 5364.Google Scholar
17. Levenson, L.L., Usui, H., Yamada, I., Takagi, T., Swartzlander, A.B., J. Vac. Sci. Techol. A7(3) (1989) 12061209.CrossRefGoogle Scholar
18. Levenson, L.L., Swartzlander, A.B., Yahashi, A., Usui, H., Yamada, I., J. Vac. Sci. Techol. A8(3) (1990) 14471452.CrossRefGoogle Scholar
19. Hirayama, H., Usui, H., Takaoka, G.H., Yamada, I., Nuc. Inst. Meth B59–60 (1991) 207210.CrossRefGoogle Scholar
20. Fukushima, K. and Yamada, I., Proc. ISIAT 91, Tokyo, (1991) 259262.Google Scholar
21. Levenson, L.L., Asano, M., Tanaka, T., Usui, H., Yamada, I., Takagi, T., J. Vac. Sci. Techol. A6(3) (1990) 15521556.Google Scholar