9 results
Efficacy of Damage Annealing in Advanced Ultra-Shallow Junction Processing
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1070 / 2008
- Published online by Cambridge University Press:
- 01 February 2011, 1070-E04-03
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- 2008
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Device Characteristics of Ultra-shallow Junctions Formed by fRTP Annealing
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- Journal:
- MRS Online Proceedings Library Archive / Volume 810 / 2004
- Published online by Cambridge University Press:
- 17 March 2011, C1.3
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- 2004
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A Comparison of Spike, Flash, SPER and Laser Annealing for 45nm CMOS
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- Journal:
- MRS Online Proceedings Library Archive / Volume 765 / 2003
- Published online by Cambridge University Press:
- 01 February 2011, D7.4
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- 2003
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Gas Flow Engineering in Rapid Thermal Processing
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- Journal:
- MRS Online Proceedings Library Archive / Volume 342 / 1994
- Published online by Cambridge University Press:
- 22 February 2011, 401
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- 1994
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Characterisation of Ion Implanted and Thin Epitaxial Layer Structures Using Photoluminescence
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- Journal:
- MRS Online Proceedings Library Archive / Volume 100 / 1988
- Published online by Cambridge University Press:
- 26 February 2011, 323
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- 1988
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Rapid Thermal Processing of Multiple Low Dose Oxygen Implantations for SIMOX
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- Journal:
- MRS Online Proceedings Library Archive / Volume 107 / 1987
- Published online by Cambridge University Press:
- 28 February 2011, 61
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- 1987
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Rapid Thermal Annealing of Ion Implanted p-n Junction in Silicon
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- Journal:
- MRS Online Proceedings Library Archive / Volume 52 / 1985
- Published online by Cambridge University Press:
- 26 February 2011, 225
- Print publication:
- 1985
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Rapid Thermal Annealing of Silicon Using an Ultrahigh Power Arc Lamp
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- Journal:
- MRS Online Proceedings Library Archive / Volume 13 / 1982
- Published online by Cambridge University Press:
- 15 February 2011, 355
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- 1982
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Rapid Annealing of Silicon
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- Journal:
- MRS Online Proceedings Library Archive / Volume 23 / 1983
- Published online by Cambridge University Press:
- 22 February 2011, 253
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- 1983
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