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A comparison of C54-TiSi2 formation in blanket and submicron gate structures using in situ x-ray diffraction during rapid thermal annealing
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- Journal:
- Journal of Materials Research / Volume 10 / Issue 9 / September 1995
- Published online by Cambridge University Press:
- 03 March 2011, pp. 2355-2359
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- September 1995
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Probing the Limits of Silicon-Based Nanoelectronics
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- Journal:
- MRS Online Proceedings Library Archive / Volume 380 / 1995
- Published online by Cambridge University Press:
- 15 February 2011, 179
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- 1995
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TiSi2 Formation on Submicron Polysilicon Lines: Role of Line Width and Dopant Concentration
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- Journal:
- MRS Online Proceedings Library Archive / Volume 303 / 1993
- Published online by Cambridge University Press:
- 21 February 2011, 109
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- 1993
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