2 results
Stresses in Gatelevel Interconnects of Wsi2 AND TaSi2
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- Journal:
- MRS Online Proceedings Library Archive / Volume 71 / 1986
- Published online by Cambridge University Press:
- 28 February 2011, 395
- Print publication:
- 1986
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In Situ Measurement of Stress. Included During Annealing, in A1-2%Cu Thin Films
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- Journal:
- MRS Online Proceedings Library Archive / Volume 47 / 1985
- Published online by Cambridge University Press:
- 22 February 2011, 121
- Print publication:
- 1985
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- Article
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