Book contents
- Frontmatter
- Contents
- List of symbols
- Preface
- Chapter 1 General features and fundamental concepts
- Chapter 2 Interatomic potentials
- Chapter 3 Dynamics of binary elastic collisions
- Chapter 4 Cross-section
- Chapter 5 Ion stopping
- Chapter 6 Ion range and range distribution
- Chapter 7 Radiation damage and spikes
- Chapter 8 Ion–solid simulations and diffusion
- Chapter 9 Sputtering
- Chapter 10 Order–disorder and ion implantation metallurgy
- Chapter 11 Ion beam mixing
- Chapter 12 Phase transformations
- Chapter 13 Ion beam assisted deposition
- Chapter 14 Applications of ion beam processing techniques
- Chapter 15 Ion beam system features
- Appendix A Crystallography
- Appendix B Table of the elements
- Appendix C Density of states
- Appendix D Derivation of the Thomas–Fermi differential equation
- Appendix E Center-of-mass and laboratory scattering angles
- Appendix F Miedema's semi-empirical model for the enthalpy of formation in the liquid and solid states
- Appendix G Implantation metallurgy – study of equilibrium alloys
- Appendix H Physical constants, conversions and useful combinations
- Index
Chapter 1 - General features and fundamental concepts
Published online by Cambridge University Press: 27 January 2010
- Frontmatter
- Contents
- List of symbols
- Preface
- Chapter 1 General features and fundamental concepts
- Chapter 2 Interatomic potentials
- Chapter 3 Dynamics of binary elastic collisions
- Chapter 4 Cross-section
- Chapter 5 Ion stopping
- Chapter 6 Ion range and range distribution
- Chapter 7 Radiation damage and spikes
- Chapter 8 Ion–solid simulations and diffusion
- Chapter 9 Sputtering
- Chapter 10 Order–disorder and ion implantation metallurgy
- Chapter 11 Ion beam mixing
- Chapter 12 Phase transformations
- Chapter 13 Ion beam assisted deposition
- Chapter 14 Applications of ion beam processing techniques
- Chapter 15 Ion beam system features
- Appendix A Crystallography
- Appendix B Table of the elements
- Appendix C Density of states
- Appendix D Derivation of the Thomas–Fermi differential equation
- Appendix E Center-of-mass and laboratory scattering angles
- Appendix F Miedema's semi-empirical model for the enthalpy of formation in the liquid and solid states
- Appendix G Implantation metallurgy – study of equilibrium alloys
- Appendix H Physical constants, conversions and useful combinations
- Index
Summary
Introduction
Ion beam processing of materials results from the introduction of atoms into the surface layer of a solid substrate by bombardment of the solid with ions in the electron-volt to mega-electron-volt energy range. The solid-state aspects are particularly broad because of the range of physical properties that are sensitive to the presence of a trace amount of foreign atoms. Mechanical, electrical, optical, magnetic, and super-conducting properties are all affected and, indeed, may even be dominated by the presence of such foreign atoms. The use of energeticions affords the possibility of introducing a wide range of atomic species, independent of thermodynamic factors, thus making it possible to obtain impurity concentrations and distributions of particular interest; in many cases, these distributions would not be otherwise attainable.
Recent interest in ion beam processing has focused on the studies of ion implantation, ion beam mixing, ion induced phase transformations, and ion beam deposition. These interests have been stimulated by the possibilities of synthesizing novel materials with potential applications in the semiconductor, tribological, corrosion, and optical fields.
Ion beam processing provides an alternative and non-equilibrium method of introducing dopant atoms into the lattice. In typical applications, a beam of dopant ions is accelerated through a potential of 10–100 kV. The implantation system shown in Fig. 1.1 illustrates the basic elements required in this technique: ion source, acceleration column, mass separator, and target chamber.
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- Chapter
- Information
- Ion-Solid InteractionsFundamentals and Applications, pp. 1 - 13Publisher: Cambridge University PressPrint publication year: 1996