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Characterization of Nanocavities in Silicon Using Small Angle X-Ray Scattering

  • Myriam Dunmont (a1), Vanessa Coulet (a2), Gabrielle Regula (a3) and Françoise Bley (a4)

Abstract

The techniques of small angle X-ray scattering and transmission electron microscopy are applied to characterize the size distribution of nanocavities in a (111) Si wafer multi-implanted with He+ in the Mev range energy. The comparison between both methods shows that they all give access to the same structural information but small angle X-ray scattering additionally offers the possibility to monitor the cavity size distribution during a thermal treatment. Moreover, providing that the collected data are of good quality, the former method also allows the knowledge of the porosity of the implanted Si wafer.

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Keywords

Characterization of Nanocavities in Silicon Using Small Angle X-Ray Scattering

  • Myriam Dunmont (a1), Vanessa Coulet (a2), Gabrielle Regula (a3) and Françoise Bley (a4)

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