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GFIS in Semiconductor Applications

Published online by Cambridge University Press:  25 July 2016

Shida Tan ,
Roy Hallstein ,
Richard H. Livengood  and
Waqas Ali
Shida Tan
Affiliation:
Intel Corporation, 2200 Mission College Blvd, Santa Clara, CA, USA
Roy Hallstein
Affiliation:
Intel Corporation, 2200 Mission College Blvd, Santa Clara, CA, USA
Richard H. Livengood
Affiliation:
Intel Corporation, 2200 Mission College Blvd, Santa Clara, CA, USA
Waqas Ali
Affiliation:
Intel Corporation, 2200 Mission College Blvd, Santa Clara, CA, USA

Abstract

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Type
Abstract
Information
Microscopy and Microanalysis , Volume 22 , Supplement S3: Proceedings of Microscopy & Microanalysis 2016 , July 2016 , pp. 156 - 157
Copyright
© Microscopy Society of America 2016 

References

References:

[1] Orloff, Jon, Utlaut, M. W. & Swanson, L. High Resolution Focused Ion Beams: FIB and Its Applications. Springer Press (2003).Google Scholar
[2] Rahman, F. F., et al, Ultramicroscopy 126, 10–18, 2013.CrossRefGoogle Scholar
[3] Ziegler, J. F., Biersack, J. P. & Littmark, U. The Stopping and Range of Ions in Solids. Pergamon, New York (1984).CrossRefGoogle Scholar