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Melting behavior of Snx(SiO2)100−x granular metal films

Published online by Cambridge University Press:  29 June 2016

K.M. Unruh ,
B. M. Patterson  and
S. I. Shah
K.M. Unruh
Affiliation:
Department of Physics and Astronomy, University of Delaware, Newark, Delaware 19716
B. M. Patterson
Affiliation:
Department of Physics and Astronomy, University of Delaware, Newark, Delaware 19716
S. I. Shah
Affiliation:
Central Research and Development Department, Experimental Station, E. I. du Pont de Nemours and Co., Wilmington, Delaware 19880
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Abstract

We have prepared a series of SnxSiO2)100−x granular metal films by RF magnetron sputtering with nominal Sn compositions from x = 30 to x = 90 at. %. X-ray diffraction and transmission electron microscopy measurements confirm that these films consist of small Sn particles, ranging from about 10 nm to 200 nm in mean diameter, embedded in an amorphous SiO2 matrix. These measurements also indicate that the mean Sn particle size decreases and the particle size distribution becomes more narrow as the Sn concentration is reduced. A differential scanning calorimeter has been used to study the size dependence of the melting temperature of the Sn particles. The melting temperature has been found to be increasingly depressed from the bulk value as the Sn particle size decreases. No evidence of an enhancement in the melting temperature at any particle size has been found. The evolution of the melting behavior of each sample with repeated melting and solidification cycles has also been studied.

Type
Articles
Information
Journal of Materials Research , Volume 7 , Issue 1 , January 1992 , pp. 214 - 218
Copyright
Copyright © Materials Research Society 1992

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