3 results
The Development of a Direct-Polish Process for STI CMP
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 767 / 2003
- Published online by Cambridge University Press:
- 01 February 2011, F5.10
- Print publication:
- 2003
-
- Article
- Export citation
Using Wafer-Scale Patterns for CMP Analysis
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 613 / 2000
- Published online by Cambridge University Press:
- 14 March 2011, D11.8.1/E8.8.1
- Print publication:
- 2000
-
- Article
- Export citation
A Novel Retaining Ring in Advanced Polishing Head Design for Significantly Improved CMP Performance
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 566 / 1999
- Published online by Cambridge University Press:
- 10 February 2011, 63
- Print publication:
- 1999
-
- Article
- Export citation