4 results
Influence of Process Parameters on Resistive Switching in MOCVD NiO Films
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1337 / 2011
- Published online by Cambridge University Press:
- 27 July 2011, mrss11-1337-q07-09
- Print publication:
- 2011
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On the Electrical Characterization of High-ĸ Dielectrics
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- Journal:
- MRS Bulletin / Volume 27 / Issue 3 / March 2002
- Published online by Cambridge University Press:
- 31 January 2011, pp. 222-225
- Print publication:
- March 2002
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The Influence of Defects on Compatibility and Yield of the HfO2-PolySilicon Gate Stack for CMOS Integration
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- Journal:
- MRS Online Proceedings Library Archive / Volume 747 / 2002
- Published online by Cambridge University Press:
- 11 February 2011, T6.7/N8.7
- Print publication:
- 2002
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The Influence of Defects on Compatibility and Yield of the HfO2-PolySilicon Gate Stack for CMOS Integration
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- Journal:
- MRS Online Proceedings Library Archive / Volume 745 / 2002
- Published online by Cambridge University Press:
- 11 February 2011, N8.7/T6.7
- Print publication:
- 2002
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- Article
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