6 results
Reduction of CV Hysteresis in Metal/High-k MISFETs Using Flash Lamp Post Deposition Annealing
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- Journal:
- MRS Online Proceedings Library Archive / Volume 811 / 2004
- Published online by Cambridge University Press:
- 28 July 2011, D3.13
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- 2004
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Dielectric breakdown Characteristics of poly-Si/HfAlOx/SiON gate stack
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- Journal:
- MRS Online Proceedings Library Archive / Volume 811 / 2004
- Published online by Cambridge University Press:
- 28 July 2011, D2.7
- Print publication:
- 2004
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Nitrided Hafnium Silicate Film Formation by Sequential Process Using a Hot Wall Batch System and Its Application to MOS Transistor
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- Journal:
- MRS Online Proceedings Library Archive / Volume 786 / 2003
- Published online by Cambridge University Press:
- 01 February 2011, E4.9
- Print publication:
- 2003
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Point defects in thin HfAlOx films probed by monoenergetic positron beams
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- Journal:
- MRS Online Proceedings Library Archive / Volume 786 / 2003
- Published online by Cambridge University Press:
- 01 February 2011, E1.2
- Print publication:
- 2003
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Physical and Electrical Properties of Al2O3, HfO2, and their Alloy Films Prepared by Atomic Layer Deposition for 65nm CMOS Gate Dielectric
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- Journal:
- MRS Online Proceedings Library Archive / Volume 745 / 2002
- Published online by Cambridge University Press:
- 11 February 2011, N5.6
- Print publication:
- 2002
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Role of ozone in reactive coevaporation of lead zirconate titanate thin films
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- Journal:
- Journal of Materials Research / Volume 13 / Issue 4 / April 1998
- Published online by Cambridge University Press:
- 31 January 2011, pp. 1015-1021
- Print publication:
- April 1998
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