7 results
The optimum standard specimen for X-ray diffraction line-profile analysis
-
- Journal:
- Powder Diffraction / Volume 10 / Issue 2 / June 1995
- Published online by Cambridge University Press:
- 10 January 2013, pp. 129-139
-
- Article
- Export citation
Contributors
-
-
- Book:
- The Cambridge Handbook of Psycholinguistics
- Published online:
- 05 November 2012
- Print publication:
- 20 August 2012, pp xi-xiv
-
- Chapter
- Export citation
F+ implants in crystalline Si: the Si interstitial contribution
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 1070 / 2008
- Published online by Cambridge University Press:
- 01 February 2011, 1070-E06-07
- Print publication:
- 2008
-
- Article
- Export citation
Ultrashallow Junction Formation and Gate Activation in Deep-Submicron CMOS
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 610 / 2000
- Published online by Cambridge University Press:
- 17 March 2011, B3.1
- Print publication:
- 2000
-
- Article
- Export citation
The Effect of Oxygen on The Electrical Activation and Diffusion of Ion-Implanted Boron
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 469 / 1997
- Published online by Cambridge University Press:
- 15 February 2011, 291
- Print publication:
- 1997
-
- Article
- Export citation
Room-Temperature Migration of Ion-Implanted Boron in Silicon
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 469 / 1997
- Published online by Cambridge University Press:
- 15 February 2011, 53
- Print publication:
- 1997
-
- Article
- Export citation
Low Energy Implantation and Transient Enhanced Diffusion: Physical Mechanisms and Technology Implications
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 469 / 1997
- Published online by Cambridge University Press:
- 15 February 2011, 265
- Print publication:
- 1997
-
- Article
- Export citation